Analysis of the various light extraction efficiency enhancement mechanisms for the GaN-based light emitting diodes (LEDs) was investigated. Experiments utilized the imprinting technique to fabricate pyramid and inverted pyramid microstructures. Roughness treatment was then integrated with these imprinting structures on patterned sapphire substrate (PSS) LEDs. An approximate 33% improvement in light output power was obtained using the pyramid profile when compared with the planar LED. This was nearly 15% higher than that of the inverted pyramid profile. The roughness effect provided an approximate 5% efficiency enhancement. The total light enhanced efficiency increased to 85.9% by integrating the imprinting pyramid structure, PSS, and surface roughness.
In order to reduce surface reflection, anti-reflective (AR) coatings are widely used on the surfaces of solar cells to improve the efficiency of photoelectric conversion. This study employed colloidal lithography with a dry etching process to fabricate sub-micron anti-reflection structures on a GaAs substrate. Etching parameters, such as RF power and etching gas were investigated to determine their influence on surface morphology. We fabricated an array of conical structures 550 nm in diameter and 450 nm in height. The average reflectance of a bare GaAs wafer was reduced from 35.0% to 2.3% across a spectral range of 300 nm - 1200 nm. The anti-reflective performance of SWSs was also calculated using Rigorous Coupled Wave Analysis (RCWA) method. Both simulation and experiment results demonstrate a high degree of similarity.
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