Experimental and simulation studies of anti-reflection sub-micron conical structures on a GaAs substrate

Abstract

In order to reduce surface reflection, anti-reflective (AR) coatings are widely used on the surfaces of solar cells to improve the efficiency of photoelectric conversion. This study employed colloidal lithography with a dry etching process to fabricate sub-micron anti-reflection structures on a GaAs substrate. Etching parameters, such as RF power and etching gas were investigated to determine their influence on surface morphology. We fabricated an array of conical structures 550 nm in diameter and 450 nm in height. The average reflectance of a bare GaAs wafer was reduced from 35.0% to 2.3% across a spectral range of 300 nm - 1200 nm. The anti-reflective performance of SWSs was also calculated using Rigorous Coupled Wave Analysis (RCWA) method. Both simulation and experiment results demonstrate a high degree of similarity.

Femtosecond laser‐produced optical absorbers for solar‐thermal energy harvesting

“…In contrast, optical absorption at a laser‐processed surface is a combined effects of surface plasmon resonance (SPR) absorption, hybridization between different SPR modes, and multiple reflections from walls of microgrooves (Figure 5). 18,69 For example, conical microstructures (CMs) are widely used as an antireflective coating in most solar energy harvesting systems 70,71 . These structures gradually change the effective refractive index at the air‐solid interface to reduce optical reflection.…”

“…18,69 For example, conical microstructures (CMs) are widely used as an antireflective coating in most solar energy harvesting systems. 70,71 These structures gradually change the effective refractive index at the air-solid interface to reduce optical reflection. Hierarchal micro/nanostructures where micron-sized microgrooves or particles are covered with nanoparticles of sizes ranging from few nanometers to several micrometers are key components for broadband optical absorption in laser-produced absorbers.…”

Fabrication and Characterization of Black GaAs Nanoarrays via ICP Etching

“…The researchers from Chinese Academy of Science [19] analyzed the properties of GaAs nanoarray anti-reflection resistance through theoretical simulation with finite-difference time-domain (FDTD) software, providing a detailed theoretical reference for the optical properties of nanostructures. In 2012, Lee et al [22] prepared sub-micron nanoarray structures on GaAs substrate using colloidal crystal lithography barrier layer, which had been widely used in solar cells. In 2016, Song et al [23] fabricated GaAs subwavelength structures by Au-assisted chemical etching.…”

Fabrication and Characterization of Black GaAs Nanoarrays via ICP Etching

“…The researchers from Chinese Academy of Science [19] analyzed the properties of GaAs nanoarray anti-re ection resistance through theoretical simulation with FDTD software, providing a detailed theoretical reference for the optical properties of nanostructures. In 2012, Yeeu-Chang Lee and his colleagues [22] prepared sub-micron nanoarray structures on GaAs substrate using colloidal crystal lithography barrier layer, which has been widely used in solar cells. In 2016, Yun won Song et.…”