A series of micrometer-scale Si thin films were fabricated by electron-beam deposition on the Cu substrate with specially treated concave-convex surface. The combined analyses involving scanning and transmission electron microscopy, selected area electron diffraction, and X-ray diffraction revealed that the deposited Si layer possessed good adhesion to the substrate and a discontinuous amorphous microstructure in which there existed large amounts of interface regions. The surface changes of the Si thin-film electrodes during Li insertion and extraction were investigated by glow discharge optical emission spectroscopy. The half-cell tests showed that these thicker films had higher capacity and more impressive cycleability relative to those reported in the literature; their cycleability could be substantially improved by limiting Li insertion depth. The full-cell tests indicated that Si films thicker than 4 m could provide sufficient capacity to match the standard LiCoO 2 cathode with a ϳ70-m-thick coating layer. Such cells demonstrated small self-discharge rate as well as good cycling stability and efficiency in the long run, suggesting feasibility for potential practical applications.
Three new stacking variants have been found in the systems MgZn2-MgAg 2 and MgCuz-MgA12. The crystal structure of Mg(Z%.ooAg0.~o) 2 has been determined by X-ray diffraction methods. The structure is a rhombo-
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