Submicron sized strip lines of NdFeAs(O,F) were fabricated and the transport properties were studied. By using laser lithography and dry etching, strip lines with a width as low as 0.84 µm were fabricated. The superconducting critical temperature was not seriously affected by the fabrication process, but a significant decrease of the critical current density (J c ) was observed for strip lines narrower than 2 µm when the sample was etched in Ar plasma. By employing a plasma free method on the other hand, the deterioration of J c was largely prevented, and the yield of obtaining strip lines with a J c higher than 5 MA cm −2 rose considerably.
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