Articles you may be interested inSub-20nm silicon patterning and metal lift-off using thermal scanning probe lithography J. Vac. Sci. Technol. B 33, 02B102 (2015); 10.1116/1.4901413 Talbot effect immersion lithography by self-imaging of very fine grating patterns J. Vac. Sci. Technol. B 30, 06FG02 (2012); 10.1116/1.4767440 Combined helium ion beam and nanoimprint lithography attains 4nm half-pitch dense patterns J. Vac. Sci. Technol. B 30, 06F304 (2012); 10.1116/1.4758768Fabrication of 22 nm half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.