The design of a two-dimensional (2D) microscanner actuated electrostatically is presented, and a silicon-oninsulator (SOI) micromachining process is utilized to fabricate the sample. The microscanner can oscillate at inherent frequencies of 1146 and 360 Hz around two rotational axes, generating maximum twisting angles of ±10 • and ±5.3 • under two 10-V square waves, respectively. A monochromatic laser projection system based on Lissajous pattern is demonstrated using the developed microscanner, revealing an image resolution of 168×56 at 20 frames per second.
The design of a two-dimensional high-frequency electrostatic microscanner is presented, and an improved method for routing isolation trenches is investigated to increase the reliability and mechanical stability of the resulting device. A sample device is fabricated and tested using an optimized micromachining process. Measurement results indicate that the sample device oscillates at inherent frequencies of 11586 and 2047 Hz around the two rotational axes, thereby generating maximum twisting angles of ±7.28 • and ±5.63 • , respectively, under two square waves of 40 V. These characteristics confirm the validity of our design and satisfy the requirements of a laser projector with VGA standards.
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