Highly sensitive and sequence-specific DNA sensors were fabricated based on silicon nanowires (SiNWs) with single stranded (ss) probe DNA molecules covalently immobilized on the nanowire surfaces. Label-free complementary (target) ss-DNA in sample solutions were recognized when the target DNA was hybridized with the probe DNA attached on the SiNW surfaces, producing a change of the conductance of the SiNWs. For a 12-mer oligonucletide probe, 25 pM of target DNA in solution was detected easily (signal/noise ratio > 6), whereas 12-mers with one base mismatch did not produce a signal above the background noise.

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A technology to reduce the dislocation density in GaN thin films by lateral overgrowth from trenches (LOFT) is reported. In LOFT, a GaN thin film was grown on sapphire substrate first, then trenches were formed into the thin film by etching. GaN material was regrown laterally from the trench sidewalls to form a continuous thin film. The average surface density of threading dislocations is reduced from 8×109/cm2 in the first GaN thin film to 6×107/cm2 in the regrown GaN thin film.

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