Cu/Zn alloy films were DC-sputtered on flexible acrylic resin-coated PET substrates and the effect of sputtering condition on the morphology and growth rate of Cu/Zn alloy films were investigated. It is found that long sputtering time, low voltage and large target-tosubstrate distance can lead to smooth and uniform films. Chamber pressure must be well controlled at several Pascal. High voltage, short target-to-substrate distance and media chamber pressure can improve the growth rate of Cu/Zn alloy films. The suitable DC sputtering condition is 1.6 kV of voltage, 25 mm of target-to-substrate distance, 10 Pa of chamber pressure and 20 min of sputtering time, under which the as-prepared Cu/Zn alloy films possess of smooth surface and 41 nm of thickness.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.