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Stanene has been theoretically predicted to be a 2D topological insulator with a large band gap, potentially hosting quantum spin Hall effect at room temperature. Here, few-layer stanene films have been epitaxially grown on Sb-terminated InSb (1 1 1) surface and their structural and electrical properties are characterized. Scanning tunneling spectrum results reveal a large bulk bandgap in single-layer stanene (over 0.2 eV). Moreover, spectroscopy evidence for a filled edge state near the steps was observed. The gap decreases dramatically with increasing number of layers, and multilayer stanene should become a Dirac semimetal in the bulk limit. The changeover may involve nontrivial topological phase transitions. Clear and reproducible Shubnikov–de Haas oscillations were observed on the single-layer stanene films that were exposed to atmospheric conditions for an extended period of time, showing the possibility for device experiments using nanofabrication and magneto-transport. Our results demonstrate that the single-layer stanene is a promising topological material for exploring fundamental physics and quantum applications.

In this study, the performance and modification mechanism of EVA (ethylene-vinyl-acetate) modified (EM), EVA/SBS (Styrene-Butadiene-Styrene) modified (ESM), and EVA/SBS/sulfur modified (ESSM) bitumens were evaluated. The physical, rheological, morphological, and structural properties were determined before and after aging, and compared with those of base bitumen. These properties were evaluation using conventional physical methods, Fourier transform infrared spectrometer, optical microscopy, dynamic shear rheometer, and bending beam rheometer, respectively. The results showed that sulfur was useful in bitumen, EVA, and SBS modification by forming a vulcanized crosslinking polymer network. The vulcanization improved most of the physical properties of ESM bitumen, especially high-and low-temperature performance, and toughness and tenacity (previously not evaluated in the literature). Meanwhile, vulcanization improved the compatibility between polymers and bitumen and increased the aging resistance of ESM bitumen. Vulcanization reactions took place without new functional groups being presented in the infrared spectrum.

A fatigue crack propagation equation of reinforced concrete (RC) beams strengthened with a new type carbon fiber reinforced polymer was proposed in this paper on the basis of experimental and numerical methods. Fatigue crack propagation tests were performed to obtain the crack propagation rate of the strengthened RC beams. Digital image correlation method was used to capture the fatigue crack pattern. Finite element model of RC beam strengthened with carbon fiber reinforced polymer was established to determinate J‐integral of a main crack considering material nonlinearities and degradation of material properties under cyclic loading. Paris law with a parameter of J‐integral was developed on the basis of the fatigue tests and finite element analysis. This law was preliminarily verified, which can be applied for prediction of fatigue lives of the strengthened RC beams.

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Although metal gate/high-k stacks are commonly used in metal-oxide-semiconductor field-effect-transistors (MOSFETs) in the 45 nm technology node and beyond, there are still many challenges to be solved. Among the various technologies to tackle these problems, interface dipole engineering (IDE) is an effective method to improve the performance, particularly, modulating the effective work function (EWF) of metal gates. Because of the different electronegativity of the various atoms in the interfacial layer, a dipole layer with an electric filed can be formed altering the band alignment in the MOS stack. This paper reviews the interface dipole formation induced by different elements, recent progresses in metal gate/high-k MOS stacks with IDE on EWF modulation, and mechanism of IDE. high-k dielectrics, metal gate, interface dipole, MOS stack, effective work function Citation:Huang A P, Zheng X H, Xiao Z S, et al. Interface dipole engineering in metal gate/high-k stacks. Chin Sci Bull, 2012, 57: 28722878, doi: 10.1007/s11434-012-5289-6As poly-Si/SiO 2 is replaced by metal gate/high-k stacks in the 45 nm MOS technological node and beyond, the interface becomes more complicated and there are still many challenges to be solved [1,2], such as the flatband voltage shift (V fb shift) [3]. Hence, the properties of the high-k layer must be reconsidered carefully. It has recently been reported that the interface dipole can induce potential difference across the interface and change the band alignment of the MOS stack, and this phenomenon can be exploited to modulate the V fb shift [4][5][6]. Elemental doping can also improve the performance of the high-k layer. Interface dipole engineering (IDE) by varying the dopants or inserting capping layers has attracted much attention in MOS technology. Not only can this technique control the V fb shift, but also the properties of the high-k dielectrics can be improved [7]. This paper reviews the formation of interface dipole, recent research progresses on IDE and effective work function (EWF) modulation, as well as mechanism of IDE in metal gate/high-k MOS stacks. Interface dipole formation in MOS stackTo control the threshold voltage (V th ), work function of a metal gate should be near the conduction band of Si (~4.3 eV) for nMOS and valence band (~5.2 eV) for pMOS. However, only very few metals can satisfy these requirements and furthermore, when a metal is in contact with the high-k layer, its Fermi-level will tend to be at the neutral level of the high-k layer. This phenomenon is called Fermi-level pinning (FLP) which causes EWF of the nMOS (pMOS) to be much greater (smaller) than the corresponding work function in vacuum [8]. The electron density in the metal gate can also influence the EWF [9]. Stacked metal layers used in the gate structure have been investigated. Misra et al. [10] reported that a metal gate stack using Ru-Ta alloys could yield a work function compatible with nMOS. Lin et al. [11] implanted N into a Mo gate that was

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