Cleavage of R-Si bonds has been found to occur unexpectedly rapidly in solutions of RSiMe,OMe (R = m-CIC,H,CH, or PhCiC) in 5 vol-% H,O-MeOH containing relatively small concentrations of NaOMe, but with a levelling off of the rate at high concentrations of the base. The behaviour is attributed to the formation of RSiMe OH and hence RSiMe,O-, and it is suggested that unimolecular dissociation of the silanolate anion RSible,Oto give Rand the silianone Me,Si=O (both of which react rapidly with the solvent) plays a significant role. The silanols RSiMe,OH are roughly estimated t o have pK, values of 11 (R = m-CIC,H,CH,) and 9.8 (R = PhCiC) in water.The cleavages of R-SiMe, bonds by NaOMe-MeOH have been studied for a wide range of R groups.' While investigating the effects of variation in the other ligands on silicon we examined the cleavage of m-ClC,H,CH,Si(OMe), in NaOMe-MeOH.(Rapid exchange of OMe groups occurs between the substrate and the solvent under these conditions, but this should not cause any complication.) We found that the change of the observed first-order rate constant on variation of the concentration of base showed a most unusual form, which we thought would best be accounted for in terms of the presence of small amounts of water, and the consequent formation of Si-OH bonds and hence silanolate ions, e.g. m-C1C6H,CH,Si(OMe),0 -. To investigate the possible role of such ions we turned to the simpler system involving use of rn-C1C6H4CH,SiMe,0Me, with the results described below. A preliminary account has appeared previously.2
Results and DiscussionObserved first-order rate constants, k, for the cleavage of m-C1C6H4CH2SiMe,0Me by 0.05-2.86~~NaOMe in anhydrous MeOH are shown in Table 1, and plotted against the base concentration in Figure 1. Table 2 lists the values of the specific rate constant, k, (= k/[NaOMe]) and of the ratio kJk,", where k," is the specific rate at low base concentrations (in this case 0 . 0 5 ~) ,