Low temperature ͑LT: 100 K͒ deposition of Fe on Si͑111͒7 ϫ 7 surface effectively reduces Fe-silicide formation at the Fe/Si interface, as compared with conventional room temperature ͑RT͒ growth. The interface condition of 5-15 monolayers ͑ML͒ LT-Fe/Si͑111͒ remains stable at least up to 350 K. Si segregation was observed after annealing at 400 K. LT-grown Fe films also reveal a relatively flat surface morphology with a roughness of 0.4-0.6 nm. Thus, LT-Fe films were suggested as an intermediate layer for the subsequent RT-growth of Fe. We use a single domain model of magnetic anisotropy to fit the magnetic coercivity evolution of n ML RT-Fe on 5 ML LT-Fe/Si͑111͒. Accordingly, we deduce the surface and volume-contributed magnetic anisotropy for discussion.
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