Both a new write-once medium with a sputtered NiO
x
film and a write-once optical disk using a blue laser has been fabricated. The optical constant of sputtered NiO
x
films for different ratios of O2/Ar was determined, and showed little dependence on sputtering ratios of O2/Ar and wavelength. The X-ray photoelectron spectra (XPS) data indicated those films have two major components, NiO and Ni2O3. Most NiO
x
films released oxygen gradually below 300°C. Over 300°C, there was an apparent transition due to the decomposition of the Ni2O3. At a writing power of 12 mW and a reading power of 0.5 mW under conditions of a numerical aperature (NA) of 0.65 and a wavelength of 405 nm, the carrier to noise ratio (CNR) was more than 47 dB and jitter was less than 13%. The recording principle depends primarily on the explosive pressure of the O2 released due to laser heating of the NiO
x
film.
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