We demonstrate strong-to-perfect absorption across a wide range of mid-infrared wavelengths (5-12µm) using a two-layer system consisting of heavily-doped silicon and a thin high-index germanium dielectric layer. We demonstrate spectral control of the absorption resonance by varying the thickness of the dielectric layer. The absorption resonance is shown to be largely polarization-independent and angle-invariant. Upon heating, we observe selective thermal emission from our materials. Experimental data is compared to an analytical model of our structures with strong agreement.
We present a review of existing and potential next-generation far-infrared (20-60 μm) optical materials and devices. The far-infrared is currently one of the few remaining frontiers on the optical spectrum, a space underdeveloped and lacking in many of the optical and optoelectronic materials and devices taken for granted in other, more technologically mature wavelength ranges. The challenges associated with developing optical materials, structures, and devices at these wavelengths are in part a result of the strong phonon absorption in the Reststrahlen bands of III-V semiconductors that collectively span the far-infrared. More than just an underexplored spectral band, the far-IR may also be of potential importance for a range of sensing applications in astrochemistry, biology, and industrial and geological processes. Additionally, with a suitable far-IR optical infrastructure, it is conceivable that even more applications could emerge. In this review, we will present recent progress on far-infrared materials and phenomena such as phononic surface modes, engineered composite materials, and optoelectronic devices that have the potential to serve as the next generation of components in a far-infrared optical tool-kit.
Articles you may be interested inEngineering absorption and blackbody radiation in the far-infrared with surface phonon polaritons on gallium phosphide Appl. Phys. Lett.
We demonstrate strong, narrow-band selective absorption and subsequent selective thermal emission from ultra-thin planar films of polar materials at mid-infrared wavelengths. Our structures consist of AlN layers of varying thicknesses deposited upon molybdenum ground planes. We demonstrate coupling to the Berreman mode at frequencies at, or near, the longitudinal optical phonon energy of AlN. Samples are characterized experimentally by temperature-, angle-, and polarization-dependent Fourier transform infrared reflection and emission spectroscopy and modeled using a transfer matrix method approach. Strong, spectrally selective thermal emission, with near angle-independent spectral position, is demonstrated from an AlN layer with thickness t<λo/100.
We demonstrate excitation of surface phonon polaritons on patterned gallium phosphide surfaces. Control over the light-polariton coupling frequencies is demonstrated by changing the pattern periodicity and used to experimentally determine the gallium phosphide surface phonon polariton dispersion curve. Selective emission via out-coupling of thermally excited surface phonon polaritons is experimentally demonstrated. Samples are characterized experimentally by Fourier transform infrared reflection and emission spectroscopy, and modeled using finite element techniques and rigorous coupled wave analysis. The use of phonon resonances for control of emissivity and excitation of bound surface waves offers a potential tool for the exploration of long-wavelength Reststrahlen band frequencies.
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