A method for three-dimensional reconstruction and imaging of surface topography in a scanning electron microscope (SEM) is briefly presented. The method is based on the ‘shape from shadows’ approach and is particularly suitable for relatively smooth surfaces, where stereoscopic methods may be less efficient. The authors used a quadruple secondary electron detector system and new numerical procedures for signal processing, which quite effectively curb main errors inherent in the method. Results of experiments prove that the vertical inaccuracy of the reconstructed shape may be reduced below 10% of the view field dimensions, if local surface inclination angles are less than 65°. Thus, a SEM equipped with the system designed by the authors may serve as a tool for the inspection and measurement of geometrical issues for several classes of micro-mechanical structures.
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A new fabrication process for mold-type SiC sharp tips for field-emission arrays has been presented. Gated emitters have been fabricated in a multi-step process using the transfer-mold technique. Gates were made of heavily boron-doped silicon, and a boron etch-stop technique for the KOH anisotropic etching was applied. The critical points of the fabrication process: anodic bonding of the silicon covered with a thin-film multi-layer of silicon oxide and boron-doped silicon carbide have been discussed in detail. The new method can be applied in the fabrication of double-gate mold-type emitters able to emit convergent electron beams.
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