Silicon is employed in a variety of electronic and optical devices such as integrated circuits, photovoltaics, sensors, and detectors. In this paper, Au-assisted etching of silicon has been used to prepare superhydrophobic surfaces that may add unique properties to such devices. Surfaces were characterized by contact angle and contact angle hysteresis. Superhydrophobic surfaces with reduced hysteresis were prepared by Au-assisted etching of pyramid-structured silicon surfaces to generate hierarchical surfaces. Consideration of the Laplace pressure on hydrophobized hierarchical surfaces gives insight into the manner by which contact is established at the liquid/composite surface interface. Light reflectivity from the etched surfaces was also investigated to assess application of these structures to photovoltaic devices.

The hydrogenation of crystalline Si by methods used to passivate defects in Si solar cells has been studied by infrared spectroscopy. For these experiments, floating-zone Si that contained Pt impurities that act as traps for H was used as a model system in which H could be directly detected. In this model system, the concentration and indiffusion depth of H were determined for different hydrogenation treatments so that their effectiveness could be compared. The postdeposition annealing of a hydrogen-rich SiN x surface layer was found to introduce H into the Si bulk with a concentration of ϳ10 15 cm −3 under the best conditions investigated here.

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Solar cell efficiencies of 18.2 and 17.8% were achieved on edge-defined film-fed grown and string ribbon multicrystalline silicon, respectively. Improved understanding and hydrogenation of defects in ribbon materials contributed to the significant increase in bulk lifetime from 1–5 μs to as high as 90–100 μs during cell processing. It was found that SiNx-induced defect hydrogenation in these ribbon materials takes place within one second at 740–750 °C. The bulk lifetime decreases at annealing temperatures above 750 °C or annealing times above one second due to the enhanced dissociation of the hydrogenated defects coupled with the decrease in hydrogen supply from the SiNx film deposited by plasma enhanced chemical vapor deposition.

Hydrogen is commonly introduced into silicon solar cells to reduce the deleterious effects of defects and to increase cell efficiency. When hydrogen is introduced into multicrystalline Si that is often used for the fabrication of solar cells, the H atoms can become trapped by carbon impurities to produce defect structures known at H2*(C). These defects act as both a source and a sink for hydrogen in H-related defect reactions. IR spectroscopy has been used to determine what H- and C-related defects are formed in multicrystalline Si when the carbon concentration is varied. A process that is used by industry to introduce hydrogen into Si solar cells is the postdeposition annealing of a hydrogen-rich SiNx layer. The H2*(C) defects provide a strategy for estimating the concentration and penetration depth of the hydrogen that is introduced by this method.