PhotocatalyticTiO2films on glass and quartz plates were obtained by the chemical vapour deposition using Ti(dpm)2(Opri)2complex compound (CC-CVD method) in a standard vacuum apparatus at 1.2–2.0 × 10-4 mbar. The substrate temperature was stabilised in the range of 450–600∘C. The growth rate varied from several nanometres to several dozen of nanometres per minute. Structural information onTiO2thin films was obtained from synchrotron radiation experiments. High-resolution grazing incidence X-ray diffraction (GIXRD) experiments were performed at the high-resolution powder diffractometer at the DESY/HASYLAB beamline B2 (Hamburg, Germany). Thin films deposited on either single-crystal Si wafers or on amorphous quartz substrates were analysed. The photocatalytic activity of theTiO2thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High-Performance Liquid Chromatography (HPLC).
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