TiO₂ thin film synthesis from complex precursors by CVD, its physical and photocatalytic properties

Abstract

PhotocatalyticTiO2films on glass and quartz plates were obtained by the chemical vapour deposition using Ti(dpm)2(Opri)2complex compound (CC-CVD method) in a standard vacuum apparatus at 1.2–2.0 × 10-4 mbar. The substrate temperature was stabilised in the range of 450–600∘C. The growth rate varied from several nanometres to several dozen of nanometres per minute. Structural information onTiO2thin films was obtained from synchrotron radiation experiments. High-resolution grazing incidence X-ray diffraction (GIXRD) experiments were performed at the high-resolution powder diffractometer at the DESY/HASYLAB beamline B2 (Hamburg, Germany). Thin films deposited on either single-crystal Si wafers or on amorphous quartz substrates were analysed. The photocatalytic activity of theTiO2thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High-Performance Liquid Chromatography (HPLC).

TiO2:(Fe, S) Thin Films Prepared from Complex Precursors by CVD, Physical Chemical Properties, and Photocatalysis

“…XRD studies of crystal structure for samples prepared with the precursor Ti(dpm) 2 (OPr i ) 2 as well as thermal de- composition mass spectrometry studies for the precursor Ti(dpm) 2 (OPr i ) 2 in vacuum and in the presence of oxygen were reported in detail earlier [38,39]. In the present work, thin films prepared from precursors Ti(dpm) 2 (OPr i ) 2 , TTIP, and doped TiO 2 :(Fe, S) were studied using θ-2θ configuration of XRD.…”

“…The layout of the photoreactor apparatus is described in detail in [38]. Briefly, the volume of irradiated solution was of 7.9 mL at 1 mm optical thickness.…”

An improvement of photocatalytic activity of TiO2 Degussa P25 powder

“…The layout of the photoreactor apparatus was described in detail in [22]. Briefly, the volume of irradiated solution was of 7.9 ml with an optical thickness of 1 mm.…”

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

“…Recently, the use of TiO 2 as a transparent conductor oxide material (TCO), has gain a generalized attention because their advantageous electronic properties and the resulting delectron conductivity, differing from other TCOs materials, like the indium-tin oxide (ITO), that have conductivity of s-electrons. Currently, there are diverse techniques for the production and synthesis of these kind of materials, in bulk or particles like sol-gel [8,9], or in the form of coatings or thin films known as the chemical vapor deposition (CVD) [10,11] and physical vapor deposition (PVD) [13]. Some important CVD methods are the plasma assisted chemical vapor deposition (PECVD) [12] or the metal-organic chemical vapor deposition (MOCVD); On the other hand, PVD include several methods, one of them is the magnetron sputtering [14] in direct current (DC) [15] or radiofrequency (RF) [16] or a combination of both DC and RF known as co-sputtering [15,16].…”