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A novel class of chemically-amplified, electron-beam molecular resists for nanometer lithography were created. These molecular resists functioned as positive resists in the presence of an acid generator, exhibiting a high sensitivity of ≈2 μC cm−2 and enabling the fabrication of ≈25 nm line patterns.

Calculational results are presented from an extensive study of the hydro-burn response of bare DT shells, inert shells, and DT-filled micro-balloons to ramp-like, Gaussian, and square laser pulses. Scaling laws are determined for the best pulse energy and time scale for shells, as functions of their mass, aspect ratio and initial density. The advantages of DT ice over DT gas in the microballoons are demonstrated. An equivalence rule is established between linear ramp pulses and Gaussians, and a connection is drawn between the ramps and square pulses. Projections are made, via the scaling rules, to breakeven-plus pellet designs. The scaling rules are used to recommend pulses for pellets recently imploded at LASL and KMSF. The calculated performance of these targets is shown to agree, after adjustments, with the laboratory findings. Attention is drawn to practical problem areas in structured pellet design.

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