By using aerosol deposition, BaTiO 3 films of more than 0.5 mm thickness were fabricated at room temperature on metal substrates. The dielectric constant of the films was 80 and their tan was 0.02 at 1 MHz. The change in the temperature characteristics of the capacitance of the films was rectilinear from room temperature to 180 C. The films were fabricated on the substrates with Ra values of 0.011 and 0.048 mm. The breakdown voltages of the films were measured: the maximum value was 220 V/mm. The volume resistivities of thin films depended on film thickness. They stabilized at a value of 10 12 Ácm when the film thickness was 5 mm or more. These electric properties are considered to depend on film density. We manufactured a noise-cutting probe with a decoupling capacitor as an inspection apparatus for microwave devices in trial production using the BaTiO 3 films fabricated by aerosol deposition. The contact probe had a 0.3 mm diameter, a 5 mm length, and a 6-mm-thick BaTiO 3 film on the outer surface. Its capacitance was 0.5 nF. Its withstand voltage was 700 V. These values are sufficient for this application.
Aerosol deposition (AD) is applicable as a fabrication technology for microstructures comprising different materials. We used this method for electronic devices that consist of ceramic films and metal electrodes. Various ceramic thick films (5–50 μm thickness), for example, Al2O3, 2MgO·SiO2, and BaTiO3, were deposited on substrates using room‐temperature aerosol deposition. The dielectric constant of BaTiO3 was 78 at 1 MHz. Multilayer constructions with ceramic films and copper electrodes were obtained using aerosol deposition and sputtering. During deposition, photoresist film masks were applied to produce patterns of ceramic films and connections between upper and lower electrodes through the ceramic films.
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