Nanoimprinting is a well-established replication technology for optical elements, with the capability to replicate highly complex micro- and nanostructures. One of the main challenges, however, is the generation of the master structures necessary for stamp fabrication. We used UV-based Nanoimprint Lithography to prepare hierarchical master structures. To realize structures with two different length scales, conventional nanoimprinting of larger structures and conformal reversal nanoimprinting to print smaller structures on top of the larger structures was performed. Liquid transfer imprint lithography proved to be well suited for this purpose. We used the sample prepared in such a way as a master for further nanoimprinting, where the hierarchical structures can then be imprinted in one single nanoimprinting step. As an example, we presented a diffusor structure with a diffraction-grating structure on top.

Nanostructured surfaces and nanoparticles are already widely employed in many different fields of research, and there is an ever-growing demand for reliable, reproducible and scalable nanofabrication methods. This is especially valid for multifunctional nanomaterials with physical properties that are tailored for specific applications. Here, we report on the fabrication of two types of nanomaterials. Specifically, we present surfaces comprising a highly uniform array of elliptical pillars as well as nanoparticles with the shape of nanopockets, possessing nano-cavities. The structures are fabricated by nanoimprint lithography, physical and wet-chemical etching and sputter deposition of thin films of various materials to achieve a multifunctional nanomaterial with defined optical and magnetic properties. We show that the nanopockets can be transferred to solution, yielding a nanoparticle dispersion. All fabrication steps are carefully characterized by microscopic and optical methods. Additionally, we show optical simulation results that are in good agreement with the experimentally obtained data. Thus, this versatile method allows to fabricate nanomaterials with specific tailor-made physical properties that can be designed by modelling prior to the actual fabrication process. Finally, we discuss possible application areas of these nanomaterials, which range from biology and medicine to electronics, photovoltaics and photocatalysis.

In this work, we present a fabrication procedure of metal nanomesh arrays with the newly developed nanoimprint resist mr-NIL212FC used in a bi-layer resist system for a lift-off process. We comparatively analyzed and evaluated nanomeshes fabricated with a freshly prepared h-PDMS/PDMS stamp and a stamp used 501 times. Therefore, we first performed a step&repeat imprint test run in a self-built low cost step&repeat UV-NIL setup. We inspected the imprint behavior of the stamp, the UV-transmission through the stamp as well as stamp lifetime and stamp degradation with regard to the possible changes of its surface roughness. The nanomesh fabrication process is characterized by a good lift-off performance, leading to a low defect density of <1.26 defects 100 µm−2. Even after 501 imprints, only a negligible stamp degradation occurred without effecting the imprint performance. Likewise, the same holds true for the nanomeshes, which showed comparable low defect densities and feature sheet resistances of 3.54 ± 0.14 Ω/□ for the first and 3.48 ± 0.23 Ω/□ for the 501st nanomesh, respectively. AFM analyses further revealed that the maximum height of the roughness Rt changed over the course of the 501 imprints from 6.3 nm to 13.3 nm, representing <5% of the overall imprint height. In general, the mr-NIL212FC resist shows a good wettability and compatibility with standard h-PDMS/PDMS stamps, a fast curing behavior, a high replication fidelity, easy separation characteristics, and a very low diffusion of resist components into the stamp. The mr-NIL212FC resist allows exposure times as short as 2 s in the applied tool setup, enabling high throughput production. Moreover, all performed measurements indicate that a much higher number of imprints with one stamp seem possible.

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Multifunctional nanoparticles are discussed as versatile probes for homogeneous immunoassays for in-vitro diagnostics. Top-down fabrication allows to combine and tailor magnetic and plasmonic anisotropic properties. The combination of nanoimprint lithography, thin film deposition, and lift-off processing provides a top-down fabrication platform, which is both flexible and reliable. Here, we discuss the material compositions and geometrical designs of monodisperse multicomponent nanoparticles and their consequences on optical and magnetic properties. The rotational hydrodynamics of nanoparticles is measured and considered under the influence of magnetic shape anisotropy in the framework of the Stoner-Wohlfarth theory. The plasmon-optical properties are explained by discrete-dipole finite-element simulations. Rotational dynamical measurements of imprinted nanoprobes for two test proteins demonstrate the applicability as highly sensitive biomolecular nanoprobes.

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Concentration gradient generators are common components of microfluidic devices when specified mixing ratios have to be acquired. However, depending on their complexity, the creation of a suitable design is an elaborate task. Although approaches exist that derive such a design, they suffer from low flexibility and usability, which is why most concentration gradient generators are still mainly designed manually thus far-a time-consuming and error-prone task. To tackle this problem, we propose a method for the automatic design of tree-shaped concentration gradient generators and introduce a publicly available online tool that automatically generates a suitable design by adjusting the hydrodynamic resistances within the network. Moreover, the proposed tool is not only able to generate designs complying with user-defined requirements, such as mixing ratios, flow rates, and channel widths but also works for any number of outlets. Simulations using a Computational Fluid Dynamics (CFD) tool as well as evaluations on fabricated designs confirm the quality of the results obtained by the proposed tool.

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