A new total-reflection zone plate that consists of a reflective zone pattern with varied-space on a flat substrate was fabricated for hard X-ray nanofocusing. This device is much easier to fabricate than other focusing devices. This is because its focusing size is much smaller than its finest constituent structure since it exploits the effect of glancing X-rays by having a small total reflection angle. Its focusing properties were evaluated using 10-keV X-rays and a focusing size of 14.4 nm was achieved.
A new method is proposed for nanoscale hard x-ray measurements. This method uses a reflection on a heavy-metal wire that functions as a single slit with a nanoscale aperture for a parallel x-ray beam. This "nanoslit" can be used to perform high-spatial-resolution measurements of the intensity distribution of a wavefront that diverges from an aperture. In experiments, Fresnel fringes generated by a rectangular aperture were measured using a 300-microm-diameter platinum wire as the nanoslit. In these experiments, the finest fringes with a period of 26 nm could be successfully resolved.
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