Secondary ion mass spectrometry can analyze all elements and has high versatility. In our laboratory, we have established a method of sputtering the whole sample from the side by using partial primary beam called Shave-off method, which increases spatial resolution and eliminates an effect originated by surface roughness. Furthermore, designing the ion optics that can enlarge and converge the emitted secondary ions from the cross section of the micro sample on the detector, high-precision three-dimensional distribution data with surface resolution of several nanometer level and depth direction resolution of several tens of nanometer level can be obtained at high speed. However, the secondary ions trajectory and the ion aberration caused by the lens in the Shave-off condition have not been verified. In this study, we have constructed a simulation of calculating the trajectory of emitted ions from the Shave-off cross section. It is expected that the simulation will be of great help and powerful tool for future development.
The angular distribution of secondary ions is one of the essential elements for the development of three-dimensional (3D) shave-off SIMS. The magnification lens system in the 3D shave-off SIMS was designed and assembled based on the detection position of the secondary ion, the emission angle of the secondary ions defined the detection position on the detector. However, shave-off condition of high incidence energy (30 keV) and high angle of incidence (87 degrees), we simulated the angular distribution of sputtered particles using the SDTrimSP program and compared the results with the previous shave-off experimental data. Even unusual the shave-off beam, the SDTrimSP simulation results showed a good agreement and a similar tendency with the experimental data. SDTrimSP simulation is expected to be useful in obtaining the sputtered particle information for development and instrumentation of the 3D shave-off SIMS.
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