Angular Distribution of Sputtered Particles in Shave-off Section Processing with SDTrimSP

Abstract

The angular distribution of secondary ions is one of the essential elements for the development of three-dimensional (3D) shave-off SIMS. The magnification lens system in the 3D shave-off SIMS was designed and assembled based on the detection position of the secondary ion, the emission angle of the secondary ions defined the detection position on the detector. However, shave-off condition of high incidence energy (30 keV) and high angle of incidence (87 degrees), we simulated the angular distribution of sputtered particles using the SDTrimSP program and compared the results with the previous shave-off experimental data. Even unusual the shave-off beam, the SDTrimSP simulation results showed a good agreement and a similar tendency with the experimental data. SDTrimSP simulation is expected to be useful in obtaining the sputtered particle information for development and instrumentation of the 3D shave-off SIMS.

Level set simulation of focused ion beam sputtering of a multilayer substrate

“…Although the functions found by Monte Carlo simulations described the angular distribution of sputtered atoms more realistically, the experimental results [ 37 ] demonstrated that, at glancing incidence angles, this distribution is shifted by 18° towards larger γ angle values compared to the data calculated using the SDTrimSP software package. In order to account for this discrepancy, when calculating the redeposited atom fluxes F r, i for incidence angles exceeding 70°, the auxiliary coordinate system ( x 1 , y 1 , z 1 ) was rotated in the ion incidence plane around the y 1 axis ( Figure 1b ).…”