We report on nanoscale strain gradients in ferroelectric HoMnO(3) epitaxial thin films, resulting in a giant flexoelectric effect. Using grazing-incidence in-plane x-ray diffraction, we measured strain gradients in the films, which were 6 or 7 orders of magnitude larger than typical values reported for bulk oxides. The combination of transmission electron microscopy, electrical measurements, and electrostatic calculations showed that flexoelectricity provides a means of tuning the physical properties of ferroelectric epitaxial thin films, such as domain configurations and hysteresis curves.

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Resistive switching (RS) phenomena are reversible changes in the metastable resistance state induced by external electric fields. After discovery $50 years ago, RS phenomena have attracted great attention due to their potential application in next-generation electrical devices. Considerable research has been performed to understand the physical mechanisms of RS and explore the feasibility and limits of such devices. There have also been several reviews on RS that attempt to explain the microscopic origins of how regions that were originally insulators can change into conductors. However, little attention has been paid to the most important factor in determining resistance: how conducting local regions are interconnected. Here, we provide an overview of the underlying physics behind connectivity changes in highly conductive regions under an electric field. We first classify RS phenomena according to their characteristic current-voltage curves: unipolar, bipolar, and threshold switchings. Second, we outline the microscopic origins of RS in oxides, focusing on the roles of oxygen vacancies: the effect of concentration, the mechanisms of channel formation and rupture, and the driving forces of oxygen vacancies. Third, we review RS studies from the perspective of statistical physics to understand connectivity change in RS phenomena. We discuss percolation model approaches and the theory for the scaling behaviors of numerous transport properties observed in RS. Fourth, we review various switching-type conversion phenomena in RS: bipolarunipolar, memory-threshold, figure-of-eight, and counter-figure-of-eight conversions. Finally, we review several related technological issues, such as improvement in high resistance fluctuations, sneak-path problems, and multilevel switching problems. V

The random circuit breaker network model is proposed for unipolar resistance switching behavior. This model describes reversible dynamic processes involving two quasi‐metastable states. The formation and rupture of conducting channels (see figure) in the polycrystalline TiO2 thin films may be analyzed by the self organized avalanche process in the random circuit breaker network model.

KoreaWe investigated a switchable ferroelectric diode effect and its physical mechanism in Pt/BiFeO 3 /SrRuO 3 thin-film capacitors. Our results of electrical measurements support that, near the Pt/BiFeO 3 interface of as-grown samples, a defective layer (possibly, an oxygenvacancy-rich layer) becomes formed and disturbs carrier injection. We therefore used an electrical training process to obtain ferroelectric control of the diode polarity where, by changing the polarization direction using an external bias, we could switch the transport characteristics between forward and reverse diodes. Our system is characterized with a rectangular polarization hysteresis loop, with which we confirmed that the diode polarity switching occurred at the ferroelectric coercive voltage. Moreover, we observed a simultaneous switching of the diode polarity and the associated photovoltaic response dependent on the ferroelectric domain configurations. Our detailed study suggests that the polarization charge can affect the Schottky barrier at the ferroelectric/metal interfaces, resulting in a modulation of the interfacial carrier injection. The amount of polarization-

We have performed x-ray absorption spectroscopy (XAS) measurements on a series of Ir-based 5d transition metal compounds, including Ir, IrCl3, IrO2, Na2IrO3, Sr2IrO4, and Y2Ir2O7. By comparing the intensity of the "white-line" features observed at the Ir L2 and L3 absorption edges, it is possible to extract valuable information about the strength of the spin-orbit coupling in these systems. We observe remarkably large, non-statistical branching ratios in all Ir compounds studied, with little or no dependence on chemical composition, crystal structure, or electronic state. This result confirms the presence of strong spin-orbit coupling effects in novel iridates such as Sr2IrO4, Na2IrO3, and Y2Ir2O7, and suggests that even simple Ir-based compounds such as IrO2 and IrCl3 may warrant further study. In contrast, XAS measurements on Re-based 5d compounds, such as Re, ReO2, ReO3, and Ba2FeReO6, reveal statistical branching ratios and negligible spin-orbit coupling effects.

Time-dependent polarization relaxation behaviors induced by a depolarization field E d were investigated on high-quality ultrathin SrRuO3/BaTiO3/SrRuO3 capacitors. The E d values were determined experimentally from an applied external field to stop the net polarization relaxation. These values agree with those from the electrostatic calculations, demonstrating that a large E d inside the ultrathin ferroelectric layer could cause severe polarization relaxation. For numerous ferroelectric devices of capacitor configuration, this effect will set a stricter size limit than the critical thickness issue.PACS numbers: 77.22. Ej, 77.22.Gm, 77.80.Dj, 77.55.+f With recent breakthroughs in fabricating high-quality oxide films [1,2,3], ultrathin ferroelectric (FE) films have attracted much attention from the scientific as well as application points of view. As the FE film thickness d approaches tens of unit cell length, the FE films often show significantly different physical properties from those of bulk FE materials. Some extrinsic effects, especially coming from FE film surfaces and/or interfaces with other materials, could be very important [4]. For some other cases, intrinsic physical quantities could play vital roles in determining the unique properties of ultrathin films.Many FE-based electronic devices have the capacitor configuration, where a FE layer is inserted between two conducting electrodes. Then, polarization bound charges will be induced at the surfaces of the FE layer, but compensated by free charge carriers in the conducting electrodes. In real conducting electrodes, however, the compensating charges will be induced with a finite extent, called the screening length λ. This will result in an incomplete compensation of the polarization charges. Such an incomplete charge compensation should induce a depolarization field E d inside the FE layer, with a direction opposite to that of the FE polarization P [5]. Therefore, E d will appear in every FE capacitor, and its effects will becomes larger with the decrease of d [5]. (For a FE film without electrodes, there is no compensation for the polarization bound charge, so the value of E d will become even larger than that of the FE capacitor case.) E d has been known to be important in determining the critical thickness [6] and domain structure of ultrathin FE films [7,8,9], and reliability problems of numerous FE devices [10,11].Recently, using a first principles calculation, Junquera and Ghosez investigated the critical thickness of BaTiO 3 (BTO) layers in SrRuO 3 (SRO)/BTO/SRO capacitor [6]. For calculations, they assumed that all of the BTO and SRO layers were fully strained with the SrTiO 3 substrate. By taking the real SRO/BTO interfaces into account properly, they showed that E d could make the ferroelectricity vanish for the BTO films thinner than 6 unit cells, i.e. 2.4 nm [6]. More recently, using pulsed laser deposition with a reflection high energy electron diffraction monitoring system, we fabricated high-quality fully-strained SRO/BTO/SRO capacitors...