The use of remote microwave plasma for the polymerization and deposition of tetraethoxysilane on the surface of polytetrafluoroethylene was investigated using a mixture of Argon and dinitrogen oxide as carrier gas. Layers with thicknesses of 0.5-3 m were obtained, differing in chemical composition, surface energy, and flexibility/ brittleness, depending on the plasma power and both the treatment and aging times. In general, milder treatments and shorter aging times resulted in higher contents of organic structural elements in the layers and greater flexibility and surface energy. Anchoring between the layers and the bulk polytetrafluoroethylene was at least partially caused by fibrils interconnecting the two components. These results were obtained by X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy in the attenuated total reflection mode, contact angle measurements, and scanning electron microscopy combined with energy dispersive X-ray analysis.
Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 µm 3 µm were obtained, differing in chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the chemical structure of our samples composed of mainly Si O and Si C groups containing aliphatics, carbonyl groups. These results were obtained by X ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined with Energy dispersive X ray spectroscopy.
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