2000
DOI: 10.1002/(sici)1097-4628(20000523)76:8<1207::aid-app1>3.0.co;2-j
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Surface modification of polytetrafluoroethylene with tetraethoxysilane by using remote argon/dinitrogen oxide microwave plasma

Abstract: The use of remote microwave plasma for the polymerization and deposition of tetraethoxysilane on the surface of polytetrafluoroethylene was investigated using a mixture of Argon and dinitrogen oxide as carrier gas. Layers with thicknesses of 0.5-3 m were obtained, differing in chemical composition, surface energy, and flexibility/ brittleness, depending on the plasma power and both the treatment and aging times. In general, milder treatments and shorter aging times resulted in higher contents of organic struct… Show more

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Cited by 5 publications
(2 citation statements)
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References 23 publications
(17 reference statements)
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“…The band at 793 cm −1 is due to CH 3 rocking at Si(CH 3 ) 2 9. A peak at 2906 cm −1 corresponds to SiOC 2 H 5 25. It can be also seen that even for higher deposition time peaks corresponding to CH 2 stretching and bending can be seen because CH 2 is present in the structure of PPTEOS.…”
Section: Resultsmentioning
confidence: 88%
See 1 more Smart Citation
“…The band at 793 cm −1 is due to CH 3 rocking at Si(CH 3 ) 2 9. A peak at 2906 cm −1 corresponds to SiOC 2 H 5 25. It can be also seen that even for higher deposition time peaks corresponding to CH 2 stretching and bending can be seen because CH 2 is present in the structure of PPTEOS.…”
Section: Resultsmentioning
confidence: 88%
“…A peak at 1352 cm −1 corresponds to SiCH 2 Si 9. Peaks at 1421 and 1402 cm −1 corresponds to SiCH 3 25. It is clear from the ATR‐FTIR observation that TEOS is getting nicely deposited onto the PE film as compared with HMDS.…”
Section: Resultsmentioning
confidence: 92%