A circular multilayer zone plate (MZP) was fabricated and its focusing performance was evaluated using 20-keV x-rays. MoSi(2) and Si layers were alternately deposited by DC magnetron sputtering on a wire core; all the interfaces satisfied the Fresnel zone condition. The measured line spread function was converted to a point spread function by tomographic reconstruction. The results suggest that the MZP has the potential to realize the diffraction-limited resolving power, which is calculated to be 35 nm using the diffraction integral. Furthermore, scanning transmission microscopy using the MZP could resolve a 50-nm line-and-space pattern.
In this study, we designed and fabricated a multilayer Laue lens (MLL) as a hard X-ray focusing device. MoSi2 and Si were chosen to form the layers by DC magnetron sputtering owing to their superior properties. The optical properties of the MLL were measured at BL24XU of SPring-8 for 20-keV X-rays. In order to confirm the effect of dynamical diffraction, far-field diffraction images were captured at various incidence angles and depths. The resultant intensity distributions showed a similar structure to those derived through calculations. An almost diffraction-limited size of 28.2 nm was obtained. The maximum local diffraction efficiency was 64.7%.
A new type of AFM tip characterizer used for characterizing nanostructures in the 10 nm to 100 nm range was developed. The characterizer was fabricated by preferential etching the edge of a cross sectioned Si/SiO 2 multilayer. Both isolated line structures and line-and-space structures were fabricated. The structural and practical properties of the fabricated tip characterizer were evaluated, and it was shown that it can be used to characterize AFM tip shapes in the 10 nm to 100 nm range.
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