Tin oxide thin films were deposited on glass substrate at (400 ºC) by using chemical spray pyrolysis technique and its composed with cobalt oxide in different ratio. The structural, morphologic and optical properties of thin films are investigated by: (XRD) X-Ray Diffraction, (AFM) Atomic Force Microscopy, (UV-Vis )Ultraviolet – Visible Spectroscopy. XRD patterns indicate that the structure of tin oxide thin film is tetragonal. All prepared films were nano materials as stated by Scherrer equation. It might have been found by AFM analysis, those surface roughness increase with increasing of cobalt ratio. By provision about Tauc plots, optical band gaps for thin
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