For the purpose of improving the crystalline quality of undoped and Si doped β-Ga2O3 films, high temperature annealing at 900°C was performed. The crystalline quality of the films investigated using scanning electron microscopy and X-ray diffraction. Also the conductivity of the films is compared before and after the annealing. After the 900°C annealing, the XRD peaks intensity corresponding to β-Ga2O3 is increased. This result indicates that the crystalline quality improves by the high temperature annealing.
Undoped and C-doped n-type β-FeSi2 thin films were epitaxially grown on p-type Si substrates by sputtering and their heterojunction diode performances were experimentally studied. The near-infrared photodetection, at a wavelength of 1.3 m, in these heterojunction diodes was clearly improved as compared to the heterojunctions comprising undoped-β-FeSi2. From X-ray diffraction and Raman spectroscopic measurements, there were no evident structural differences between the undoped and C-doped films. C-doping hardly affects the crystallization and epitaxial growth of β-FeSi2. The enhancement in the diode performance by C-doping might be owing to C atoms terminating dangling bonds and compensating defects in β-FeSi2 crystals.
n-Type NC-FeSi2/p-type Si heterojunctions were successfully fabricated by PLD, and their forward current-voltage characteristics were analyzed on the basis of thermionic emission theory (TE) in the temperature range from 300 down to 77 K. With a decrease in the temperature, the ideality factor was increased while the zero-bias barrier height was decreased. The calculated values of ideality factor and barrier height were 3.07 and 0.63 eV at 300 K and 10.75 and 0.23 eV at 77 K. The large value of ideality factor indicated that a tunneling process contributes to the carrier transport mechanisms in the NC-FeSi2 films. The series resistance, which was estimated by Cheungs method, was strongly dependent on temperature. At 300 K, the value of series resistance was 12.44 Ω and it was dramatically enhanced to be 1.71× 105 Ω at 77 K.
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