The phenomenal rate of increase in the integration density of silicon chips has been sustained in large part by advances in optical lithography--the process that patterns and guides the fabrication of the component semiconductor devices and circuitry. Although the introduction of shorter-wavelength light sources and resolution-enhancement techniques should help maintain the current rate of device miniaturization for several more years, a point will be reached where optical lithography can no longer attain the required feature sizes. Several alternative lithographic techniques under development have the capability to overcome these resolution limits but, at present, no obvious successor to optical lithography has emerged.

During a dyadic social interaction, two individuals can share visual attention through gaze, directed to each other (mutual gaze) or to a third person or an object (joint attention). Shared attention is fundamental to dyadic face-to-face interaction, but how attention is shared, retained, and neutrally represented in a pair-specific manner has not been well studied. Here, we conducted a two-day hyperscanning functional magnetic resonance imaging study in which pairs of participants performed a real-time mutual gaze task followed by a joint attention task on the first day, and mutual gaze tasks several days later. The joint attention task enhanced eye-blink synchronization, which is believed to be a behavioral index of shared attention. When the same participant pairs underwent mutual gaze without joint attention on the second day, enhanced eye-blink synchronization persisted, and this was positively correlated with inter-individual neural synchronization within the right inferior frontal gyrus. Neural synchronization was also positively correlated with enhanced eye-blink synchronization during the previous joint attention task session. Consistent with the Hebbian association hypothesis, the right inferior frontal gyrus had been activated both by initiating and responding to joint attention. These results indicate that shared attention is represented and retained by pair-specific neural synchronization that cannot be reduced to the individual level.

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We suggest that adults with autism have deficits in attentional disengagement and the physiological substrates underlying deficits in autism and mental retardation are different.

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Earlier studies have demonstrated that attention-deficit hyperactivity disorder (ADHD) is associated with aberrant sensitivity to rewards and punishments. Although some studies have focused on real-life decision making in children with ADHD using the Iowa gambling task, the number of good deck choices, a frequently used index of decision-making ability in the gambling task, is insufficient for investigating the complex decision-making strategies in subjects. In the present study, we investigated decision-making strategies in ADHD children, analyzing T-patterns with rewards, with punishments, and without rewards and punishments during the gambling task, and examined the relationship between decision-making strategies and skin conductance responses (SCRs) to rewards and punishments. We hypothesized that ADHD children and normal children would employ different decision-making strategies depending on their sensitivity to rewards and punishments in the gambling task. Our results revealed that ADHD children had fewer T-patterns with punishments and exhibited a significant tendency to have many T-patterns with rewards, thus supporting our hypothesis. Moreover, in contrast to normal children, ADHD children failed to demonstrate differences between reward and punishment SCRs, supporting the idea that they had an aberrant sensitivity to rewards and punishments. Therefore, we concluded that ADHD children would be impaired in decision-making strategies depending on their aberrant sensitivity to rewards and punishments. However, we were unable to specify whether large reward SCRs or small punishment SCRs is generated in ADHD children.

The development of optical lithography has promoted the development of ultralarge scale integration (ULSI) devices. However, optical lithography is now facing serious obstacles due to the limitations in wavelength. Higher resolution with sufficient depth of focus is the most important requirement for ULSI engineers. To satisfy this requirement, many technologies for resolution improvement and new optical image formation technologies such as phase shifting and focus latitude enhancement exposure (FLEX) are reviewed, and a future perspective on optical lithography is also discussed in this paper.

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