Articles you may be interested inEpitaxial high saturation magnetization FeN thin films on Fe(001) seeded GaAs(001) single crystal wafer using facing target sputterings Fe-N gradient films were prepared with a facing targets sputtering system. During deposition, the nitrogen pressure increased linearly up to a value, which is called the "ultimate pressure." Composition profiles, microstructure, magnetic properties, and corrosion resistance of the films were investigated by various methods. The experimental results indicate that the Fe-N films possess some composition and structural gradients. The Fe concentration decreases from the substrate to the film surface from 100 to 66 at. %. The phases d'-FelsNZ, ?/-Fe,N, E-FeXN(2
The functionally gradient materials (FGMS) are important in both theory and practical applications. UP to now, almost all previous work has been concentrated on bulk materials. This paper describes the preparation of Fe-N gradient thin films by a facing targets sputtering system. Rutherford backscattering spectrometry (RBS) shows that the concentration of Fe atoms or N atoms varies gradually from the substrate to the surface throughout the whole thickness of the film. The Fe-N gradient films contain crystal phases of zeta -Fe2N, epsilon -FexN(2
(Fe, Ti) - N films with the titanium concentration were prepared on Si(100) and NaCl substrates held at by facing-target sputtering. The effects of Ti doping on the structures and magnetic properties of Fe - N films were investigated. The crystal structures of the (Fe, Ti) - N films were examined with an x-ray diffractometer and a transmission electron microscope. The formation of magnetic iron nitride phases is sensitive to the Ti doping concentration. Films with contain and phases, and films with contain and TiN phases, but there is no magnetic iron nitride phase in the films with . The saturation magnetization of (Fe, Ti) - N films with was larger than that of pure bcc iron. was 2.6 T for samples, which is higher than the value for pure iron by 17%.
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