Fe-N gradient thin films prepared by facing targets sputtering

Abstract

The functionally gradient materials (FGMS) are important in both theory and practical applications. UP to now, almost all previous work has been concentrated on bulk materials. This paper describes the preparation of Fe-N gradient thin films by a facing targets sputtering system. Rutherford backscattering spectrometry (RBS) shows that the concentration of Fe atoms or N atoms varies gradually from the substrate to the surface throughout the whole thickness of the film. The Fe-N gradient films contain crystal phases of zeta -Fe2N, epsilon -FexN(2<x<or=3), gamma '-Fe4N, and alpha "-Fe16N2 as well.

Influence of total gas pressure on the microstructure and properties of CrAlN films deposited by a pulsed DC balanced magnetron sputtering system

“…There are some reports on the effect of sputtering conditions and pulsing parameters on the properties and structure of CrAlN film in unbalanced magnetron sputtering systems, but there are only few reports on these effects in a balanced magnetron sputtering system. Facing target-type sputtering is one of the balanced magnetron sputtering systems, frequently used for the deposition of magnetic materials [23,24], hard coatings [25] and transparent conducting coatings [26]. We need to investigate the effect of sputtering conditions and pulsing parameters on the microstructure and mechanical properties of CrAlN films in balanced magnetron spattering system.…”

Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content

“…Facing target type sputtering is one of the balanced magnetron sputtering system, which technique is frequently used for the deposition of magnetic materials 5,6) hard coatings 7) and transparent conducting coatings. 8) We need to investigate the effect of pulsing parameters on the mechanical properties and morphology of nitride films in Balanced Magnetron Spattering system.…”

Study on amorphous carbon nitride film prepared by facing target sputtering

“…Facing target sputtering (FTS) is one of the widely used techniques for the deposition of hard coatings [15,16], magnetic materials [17][18][19] and transparent conducting coatings [20,21]. The system consists of two magnetron targets placed opposite each other, with the substrates held on a plane perpendicular to the surface of the targets.…”