In this study, CdSe/ZnS core-shell quantum dots (QDs) with various dimensions were used as the color conversion materials. QDs with dimensions of 3 nm and 5 nm were excited by gallium nitride (GaN)-based blue micro-light-emitting diodes (micro-LEDs) with a size of 30 μm × 30 μm to respectively form the green and red lights. The hybrid Bragg reflector (HBR) with high reflectivity at the regions of the blue, green, and red lights was fabricated on the bottom side of the micro-LEDs to reflect the downward light. This could enhance the intensity of the green and red lights for the green and red QDs/micro-LEDs to 11% and 10%. The distributed Bragg reflector (DBR) was fabricated on the QDs color conversion layers to reflect the non-absorbed blue light that was not absorbed by the QDs, which could increase the probability of the QDs excited by the reflected blue light. The blue light absorption material was deposited on the DBR to absorb the blue light that escaped from the DBR, which could enhance the color purity of the resulting green and red QDs/micro-LEDs to 90.9% and 90.3%, respectively.
In the study, the yttrium (Y)-doped vanadium oxide (VOx:Y) films used as the sensitive layers of microbolometers were deposited using a radio frequency magnetron co-sputtering system. The temperature coefficient of resistance (TCR) of the VOx:Y films was enhanced from −1.88%/°C to −2.85%/°C in comparison with that of the VOx films. To further improve the performance of microbolometers, the nanomesh antireflection layer was placed on the top surface of the microbolometers to reduce the infrared reflection. The responsivity, thermal time constant, thermal conductivity, absorptance, and detectivity of the VOx:Y microbolometers with nanomesh antireflection layer were 931.89 ± 48 kV/W, 4.48 ms, 6.19×10−8 W/K, 74.41% and 2.20×108 cmHz0.5W−1, respectively.
In this work, Ga2O3 films were deposited on sapphire substrates using a plasma-enhanced atomic layer deposition system with trimethylgallium precursor and oxygen (O2) plasma. To improve the quality of Ga2O3 films, they were annealed in an O2 ambient furnace system for 15 min at 700, 800, and 900 °C, respectively. The performance improvement was verified from the measurement results of X-ray diffraction, X-ray photoelectron spectroscopy, and photoluminescence spectroscopy. The optical bandgap energy of the Ga2O3 films decreased with an increase of annealing temperatures. Metal-semiconductor-metal ultraviolet C photodetectors (MSM UVC-PDs) with various Ga2O3 active layers were fabricated and studied in this work. The cut-off wavelength of the MSM UVC-PDs with the Ga2O3 active layers annealed at 800 °C was 250 nm. Compared with the performance of the MSM UVC-PDs with the as-grown Ga2O3 active layers, the MSM UVC-PDs with the 800 °C-annealed Ga2O3 active layers under a bias voltage of 5 V exhibited better performances including photoresponsivity of 22.19 A/W, UV/visible rejection ratio of 5.98 × 104, and detectivity of 8.74 × 1012 cmHz1/2W−1.
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