Here, bottom‐up nanofabrication for the two‐dimensional self‐organization of a highly integrated, well‐defined silicon nanowire (SiNW) mesh on a naturally‐patterned Si(110)–16 × 2 surface by controlling the lateral growths of two non‐orthogonal 16 × 2 domains is reported. This self‐ordered nanomesh consists of two crossed arrays of parallel‐aligned SiNWs with nearly identical widths of 1.8–2.5 nm and pitches of 5.0–5.9 nm, and is formed over a mesoscopic area of 300 × 270 nm2 so as to show a high integration density in excess of 104 µm−2. These crossed SiNWs exhibit semiconducting character with an equal band gap of ∼0.95 eV as well as unique quantum confinement effect. Such an ultrahigh‐density SiNW network can serve as a versatile nanotemplate for nanofabrication and nanointegration of the highly‐integrated metal‐silicide or molecular crossbar nanomesh on Si(110) surface for a broad range of device applications. Also, the multi‐layer, vertically‐stacked SiNW networks can be self‐assembled through hierarchical growth, which opens the possibility for creating three‐dimensionally interconnected crossbar circuits. The ability to self‐organize an ultrahigh‐density, functional SiNW network on a Si(110) surface represents a simple step toward the fabrication of highly‐integrated crossbar nanocircuits in a very straightforward, fast, cost‐effective, and high throughput process.
A well-ordered two-dimensional (2D) network consisting of two crossed Au silicide nanowire (NW) arrays is self-organized on a Si(110)-16 x 2 surface by the direct-current heating of approximately 1.5 monolayers of Au on the surface at 1100 K. Such a highly regular crossbar nanomesh exhibits both a perfect long-range spatial order and a high integration density over a mesoscopic area, and these two self-ordering crossed arrays of parallel-aligned NWs have distinctly different sizes and conductivities. NWs are fabricated with widths and pitches as small as approximately 2 and approximately 5 nm, respectively. The difference in the conductivities of two crossed-NW arrays opens up the possibility for their utilization in nanodevices of crossbar architecture. Scanning tunneling microscopy/spectroscopy studies show that the 2D self-organization of this perfect Au silicide nanomesh can be achieved through two different directional electromigrations of Au silicide NWs along different orientations of two nonorthogonal 16 x 2 domains, which are driven by the electrical field of direct-current heating. Prospects for this Au silicide nanomesh are also discussed.
The frontispiece shows a scanning tunneling microscopy image of a well‐ordered Au silicide nanowire network self‐organized on a 16×2 superstructure of a Si(110) surface by post‐deposition annealing at 1100 K. This nanomesh consists of two crossed arrays of parallel‐aligned Au silicide nanowires with distinctly different sizes and conductivities. The ability to form a perfectly ordered 2D nanomesh on a Si(110) nanotemplate represents a step towards the nanofabrication of integrated 2D crossbar nanocircuits in a very straightforward, fast, cost‐effective, and high‐throughput process. For more information, please read the Full Paper “Two‐Dimensional Self‐Organization of an Ordered Au Silicide Nanowire Network on a Si(110) 16×2 Surface” by I.‐H. Hong et al., beginning .
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