The authors measure the dielectric functions of (GeTe, Sb2Te3) pseudobinary thin films by using spectroscopic ellipsometry. By using standard critical point model, they obtained the optical transition (critical point) energies of the amorphous (crystalline) thin films. The optical (indirect band) gap energies of the amorphous (crystalline) phase are estimated from the linear extrapolation of the absorption coefficients. The band structure calculations show that GeTe, Ge2Sb2Te5, and Ge1Sb2Te4 have indirect gap whereas Ge1Sb4Te7 and Sb2Te3 have direct gap. The measured indirect band gap energies match well with electronic band structure calculations.
Amorphous GaInZnO and polycrystalline ZnO thin films are grown by rf magnetron sputtering. Their optical properties are investigated by spectroscopic ellipsometry. The optical gap of the GaInZnO film increases with the increase of Ga content and by annealing. These are attributed to the large band-gap energy of Ga2O3 and the structural relaxation after annealing, respectively. The changes in optical properties show a strong correlation to the device characteristics of GaInZnO thin film transistors: The turn-on voltage increases as the optical gap increases with increasing Ga∕In ratio. This study shows that the GaInZnO thin films are as excellent as transparent oxide semiconductors.
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