“…In Ref. , the existence of Ni 2 O 3 phase was suspected but no evidence was found to suggest that the Ni 2 O 3 phase is thermodynamically stable. Hence, the increase in oxygen content in NiO x films kept in natural atmosphere for 50 days is due to hydroxylation of the oxide surface.…”
This work reports on the effect of ultraviolet (UV) laser irradiation on the structural, electrical, and optical properties of nickel oxide (NiOx) thin films, deposited by reactive sputtering of nickel in an oxygen containing atmosphere. It was found that the conduction type can be changed from p‐type to n‐type and the resistivity decreased as the number of laser pulses is increased and then increases again. The as‐deposited films are polycrystalline, while laser irradiation renders the films amorphous. The observed transition from O‐rich NiOx as‐deposited films to Ni‐rich laser‐irradiated NiOx can be significant to electrochromic, resistive switching, and other applications. The band gap of the as‐deposited and the laser irradiated NiOx films was obtained from spectroscopic ellipsometry measurements and was found to slightly increase upon laser irradiation. It is also observed that the surface roughness increases slightly. Aging effects or instabilities in the structure and composition of the films are also observed under normal conditions.
“…In Ref. , the existence of Ni 2 O 3 phase was suspected but no evidence was found to suggest that the Ni 2 O 3 phase is thermodynamically stable. Hence, the increase in oxygen content in NiO x films kept in natural atmosphere for 50 days is due to hydroxylation of the oxide surface.…”
This work reports on the effect of ultraviolet (UV) laser irradiation on the structural, electrical, and optical properties of nickel oxide (NiOx) thin films, deposited by reactive sputtering of nickel in an oxygen containing atmosphere. It was found that the conduction type can be changed from p‐type to n‐type and the resistivity decreased as the number of laser pulses is increased and then increases again. The as‐deposited films are polycrystalline, while laser irradiation renders the films amorphous. The observed transition from O‐rich NiOx as‐deposited films to Ni‐rich laser‐irradiated NiOx can be significant to electrochromic, resistive switching, and other applications. The band gap of the as‐deposited and the laser irradiated NiOx films was obtained from spectroscopic ellipsometry measurements and was found to slightly increase upon laser irradiation. It is also observed that the surface roughness increases slightly. Aging effects or instabilities in the structure and composition of the films are also observed under normal conditions.
“…The procedure is to vary the fitting parameters to minimize the difference between the measured and calculated and values. The Levenberg-Marquardt regression algorithm was used for minimizing the mean-squared error (MSE) [24]:…”
Section: Calculation Of the Optical Constants In Terms Of The Spectromentioning
“…The Levenberg-Marquardt regression algorithm was used for minimizing the mean-squared error (MSE) [33], defined as where N is the number of (ψ , Δ, T) triplets, M is the number of fitted parameters in the model and σ are standard deviations of the experimental data points. The MSE value is the basis for estimating the quality of the match between the data calculated from the model data ( Multiple-sample analyses [28] were applied for the films of W oxide and Ni oxide.…”
Section: Methodsmentioning
confidence: 99%
“…A third reason is that the optical properties of the pure oxides serve as starting points for understanding the EC performance of mixed W-Ni oxides which, as shown recently [15], can exhibit superior optical properties. Spectroscopic ellipsometry (SE) is the technique par preférénce to investigate the optical properties [16], and, not surprisingly, it has been used in the past for detailed studies on EC films of W oxide made by evaporation [17][18][19][20][21], sputter deposition [22][23][24][25][26][27][28][29], and sol-gel technology [30], as well as EC films of Ni oxide made by pulsed laser deposition [31], sputtering [23,25,32,33], atomic layer deposition [34], and sol-gel technology [35].…”
This is an author produced version of a paper published in Solar Energy Materials and Solar Cells. This paper has been peer-reviewed but does not include the final publisher proof-corrections or journal pagination.
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AbstractElectrochromic films of tungsten oxide and nickel oxide were made by reactive dc magnetron sputtering and were characterized by X-ray diffraction, Rutherford backscattering spectrometry, scanning electron microscopy, and atomic force microscopy. The optical properties were investigated in detail by spectroscopic ellipsometry and spectrophotometry, using a multiple-sample approach. The W oxide film was modeled as a homogeneous isotropic layer, whereas the Ni oxide film was modeled as an anisotropic layer with the optical axis perpendicular to the surface. Parametric models of the two layers were then used to derive complex refractive index in the 300-1700-nm-range, film thickness, and surface roughness. A band gap of 3.15 eV was found for the W oxide film, using a Tauc-Lorentz parameterization. For the Ni oxide film, taken to have direct optical transitions, band gaps along the optical axis, perpendicular to it, and in an isotropic intermediate layer at the bottom of the film were found to be 3.95, 3.97, and 3.63 eV, respectively. Parameterization for the Ni oxide was made by use of the Lorentz model.
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