Realizing a neuromorphic-based artificial visual system with low-cost hardware requires a neuromorphic device that can react to light stimuli. This study introduces a photoresponsive neuron device composed of a single transistor, developed by engineering an artificial neuron that responds to light, just like retinal neurons. Neuron firing is activated primarily by electrical stimuli such as current via a well-known single transistor latch phenomenon. Its firing characteristics, represented by spiking frequency and amplitude, are additionally modulated by optical stimuli such as photons. When light is illuminated onto the neuron transistor, electron−hole pairs are generated, and they allow the neuron transistor to fire at lower firing threshold voltage. Different photoresponsive properties can be modulated by the intensity and wavelength of the light, analogous to the behavior of retinal neurons. The artificial visual system can be miniaturized because a photoresponsive neuronal function is realized without bulky components such as image sensors and extra circuits.
In this study, we proposed a strategy to fabricate vertically stacked subpixel (VSS) micro-light-emitting diodes (μ-LEDs) for future ultrahigh-resolution microdisplays.
Although they have
attracted enormous attention in recent years,
software-based and two-dimensional hardware-based artificial neural
networks (ANNs) may consume a great deal of power. Because there will
be numerous data transmissions through a long interconnection for
learning, power consumption in the interconnect will be an inevitable
problem for low-power computing. Therefore, we suggest and report
3D stackable synaptic transistors for 3D ANNs, which would be the
strongest candidate in future computing systems by minimizing power
consumption in the interconnection. To overcome the problems of enormous
power consumption, it might be necessary to introduce a 3D stackable
ANN platform. With this structure, short vertical interconnection
can be realized between the top and bottom devices, and the integration
density can be significantly increased for integrating numerous neuromorphic
devices. In this paper, we suggest and show the feasibility of monolithic
3D integration of synaptic devices using the channel layer transfer
method through a wafer bonding technique. Using a low-temperature
processible III–V and composite oxide (Al2O3/HfO2/Al2O3)-based weight
storage layer, we successfully demonstrated synaptic transistors showing
good linearity (αp/αd = 1.8/0.5),
a high transconductance ratio (6300), and very good stability. High
learning accuracy of 97% was obtained in the training of 1 million
MNIST images based on the device characteristics.
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