The versatile nature of photo-induced thiol-ene chemistry has made it one of the most popular reactions in the design of polymer networks. In the present work, the structure of uniform thiol-ene and complex binary thiol-acrylate networks are studied in detail by photopolymerizing cycloaliphatic and linear alkyl thiols with an allyl monomer and its acrylic counterpart. Along with the crosslink kinetics, the balance between step growth and chain growth mechanism of the two different systems is investigated by FT-IR spectroscopy. Low field NMR experiments are carried out to obtain an insight into the chain dynamics and structure of the photopolymer networks. In addition, tensile properties and glass transition temperature are determined to correlate network properties with mechanical performance.
The present work aims at the preparation of dry adhesives with switchable bonding properties by using the reversible nature of the [4πs+4πs] cycloaddition of anthracenes. Photo-responsive hydrogenated carboxylated nitrile butadiene rubber with photo-responsive pendant anthracene groups is prepared by one-pot synthesis. The formation of 3D networks relies on the photodimerization of the anthracene moieties upon UV exposure (λ > 300 nm). Controlled cleavage of the crosslink sites is achieved by either deep UV exposure (λ = 254 nm) or thermal dissociation at 70 °C. The kinetics of the optical and thermal cleavage routes are compared in thin films using UV-vis spectroscopy and their influence on the reversibility of the network is detailed. Going from thin films to free standing samples the modulation of the network structure and thermo-mechanical properties over repeated crosslinking and cleavage cycles are characterized by low-field NMR spectroscopy and dynamic mechanical analysis. The applicability of the stimuli-responsive networks as adhesives with reversible bonding properties is demonstrated. The results evidence that the reversibility of the crosslinking reaction enables a controlled switching "on" and "off" of adhesion properties. The recovery of the adhesion force amounts to 75 and 80% for photo- and thermal dissociation, respectively. Spatial control of adhesion properties is evidenced by adhesion force mapping experiments of photo-patterned films.
This work deals with the in-depth investigation of thiol-yne based network formation and its effect on thermomechanical properties and impact strength. The results show that the bifunctional alkyne monomer di(but-1-yne-4-yl)carbonate (DBC) provides significantly lower cytotoxicity than the comparable acrylate, 1,4-butanediol diacrylate (BDA). Real-time near infrared photorheology measurements reveal that gel formation is shifted to higher conversions for DBC/thiol resins leading to lower shrinkage stress and higher overall monomer conversion than BDA. Glass transition temperature (T ), shrinkage stress, as well as network density determined by double quantum solid state NMR, increase proportionally with the thiol functionality. Most importantly, highly cross-linked DBC/dipentaerythritol hexa(3-mercaptopropionate) networks (T ≈ 61 °C) provide a 5.3 times higher impact strength than BDA, which is explained by the unique network homogeneity of thiol-yne photopolymers.
This work deals with the toughening effect of flaky WS 2 and fullerene-like WS 2 (IF-WS 2 ) nanoparticles on epoxy with varying network properties. Reducing the amount of curing agent resulted in decreased crosslink density as measured by dynamic-mechanic analysis and double-quantum nuclear magnetic resonance spectroscopy. Although that lead to moderate changes in the epoxy's tensile properties, its fracture toughness dropped drastically, probably due to an increased defect fraction. IF-WS 2 could be dispersed significantly more effectively within epoxy resin than flaky WS 2 , possibly due to its spherical shape, but caused less toughening. IF-WS 2 tended to debond from the epoxy, while flaky WS 2 introduced more secondary cracks. Both increased the fracture toughness of the (brittle) substoichiometric, but not that of the (tough) stoichiometric epoxy, possibly due to their interaction with molecular defects. Irrespective of which mechanism resulted in the toughening effect, its effectiveness depended strongly on the epoxy matrix.
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