Projection reduction exposure with variable axis immersion lenses (PREVAIL) represents the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner; another e-beam projection approach is SCALPEL pursued by Lucent Technologies. This article discusses the challenges and accomplishments of the PREVAIL project. It will focus on the results obtained with the proof of concept (POC) system. This system was developed to demonstrate key technical building blocks required for high throughput, high resolution e-beam step, and scan projection lithography. The supreme challenge facing all e-beam lithography approaches has been and still is throughput. Since the throughput of e-beam projection systems is severely limited by the available optical field size, the key to success is the ability to overcome this limitation. The PREVAIL technique overcomes field-limiting off-axis aberrations through the use of variable axis lenses, which electronically shift the optical axis simultaneously with the deflected beam, so that the beam effectively remains on axis. This technique developed by IBM has been successfully applied to probe-forming shaped beam systems (EL-4). It had to be modified and extended to provide the larger beam deflections and the wider beam images at the wafer plane used in projection reduction systems. The POC system projects sequentially 1×1 mm2 subfields, selected at the reticle, in 4:1 reduction mode onto the wafer, exposing and resolving patterns of 80 nm lines and spaces in resist; each subfield contains 107 pixels. The deflection capability demonstrated permits electronic selection of 20 1 mm subfields at the reticle and projection of these 20 subfields onto the wafer exposing a field with 5 mm scan length. The resist images provide proof that PREVAIL effectively eliminates off-axis aberrations affecting resolution, since the deflected and undeflected images are indistinguishable. PREVAIL also controls off-axis aberrations affecting placement accuracy of pixels, since distortions of the deflected subfield are corrected to within 12 nm. A high emittance gun has been developed to provide uniform illumination of the patterned subfield, and to fill the large numerical aperture of the projection optics required to significantly reduce beam blur caused by Coulomb interaction.
In the PREVAIL proof of concept electron beam projection lithography system, 1 mmϫ1 mm sq reticle subfields are illuminated and imaged to a wafer with 4ϫ demagnification. A relatively large beam semiangle ͑5-8 mr at the wafer͒ is required to optimize resolution at the beam currents ͑5-15 A͒ needed for high-throughput lithography. A high emittance source and illumination system have been developed which can uniformly illuminate the reticle subfield with a beam semiangle up to 16.3 mr (1/e) at the wafer. The source utilizes a tantalum single crystal 10 mm in diameter. The crystal is heated by electron bombardment incident on the side opposite the emitting surface, which is a low work function crystal plane. A variation of the ''critical Köhler'' illumination scheme is utilized wherein the cathode surface is imaged approximately to a square shaping aperture, and the shaping aperture is conjugate to the reticle ͑and the wafer͒. The emission is temperature limited, so care must be taken to obtain a uniform temperature distribution across the emitter surface. Long term emission current stability better than 1% is provided by servo control of the bombardment heating power. Illumination uniformity has been measured at the wafer plane using a pinhole detector. The measured 3 variation in current density is 3.2%. On the basis of these results, the tighter specifications required for a commercial PREVAIL projection system appear achievable.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.
hi@scite.ai
10624 S. Eastern Ave., Ste. A-614
Henderson, NV 89052, USA
Copyright © 2024 scite LLC. All rights reserved.
Made with 💙 for researchers
Part of the Research Solutions Family.