This paper reports neodymium doped bismuth borosilicate glasses in composition (40-x)B2O3-40Bi2O3-20SiO2-xNd2O3 where x = 0, 0.5, 1.0, 1.5, 2.0 and 2.5 mol%, have been prepared by melt quenching technique and are characterized through physical properties structural properties, optical absorption spectra and emission spectra measurements. The density is found to increase with the increase in concentration of Nd2O3. The molar volumes of glass decrease where concentration of Nd2O3 where concentration of Nd2O3 is 0-0.5 mol% and beyond 0.5 mol% that molar volumes were increased. The absorption spectra of Nd3+-doped glass centered at 512 nm (4I9/2→2K13/2+4G9/2), 526 nm (4I9/2→4G7/2), 584 nm (4I9/2→4G5/2+2G7/2), 625 nm (4I9/2→2H11/2), 681 nm (4I9/2→4F9/2), 747 nm (4I9/2→4F7/2+4S3/2), 804 nm (4I9/2→4F5/2+2H9/2) and 877 nm (4I9/2→4F3/2) have been observed. The emission spectra of glass were also investigated.
This research, photons shielding properties such as mass attenuation coefficients (mm), effective atomic number (Zeff), effective electron density (Nel) and kinetic energy per unit mass (kerma) relative to air for WO3 based on TeO2–P2O5–WO3 glass system have been simulated by WinXCom software program at energies of 10–3–105 MeV. Also, buildup factors (BFs) have been estimated at widely energy ranging 15 keV – 15 MeV for penetration depths (PD) until 40 mean free path (mfp). The results of glass system in formula (70–x) TeO2–30P2O5–xWO3 at x = 10, 20, 30, 40, and 50 mol% exhibited that the partial replacement of TeO2 by WO3 was adjusted photons attenuation behaviors for get better. In addition, mass sopping power (MSP) and projected range (PR) were evaluated using SRIM software program for proton (H+1) and alpha particles (He+2) at kinetic energy ranging 10 keV – 10 MeV. The results may be inferred that glass sample with high WO3 content was superb for photons, proton and alpha particles attenuation. The results of this research may be useful in enhancing optimization and potential to use as a transparent material to against photon, proton and alpha particles.
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