A wireless sensor based on bioresponsive DNA hydrogel provides smartphone-based detection of wound infection.

Modern metamaterials face functional constraints as they are commonly embedded in or deposited on dielectric materials. We provide a new solution by microfabricating a completely free-standing all-metal self-supported metamaterial. Using upright S-string architecture with the distinctive feature of metallic transverse interconnects, we form a locally stiff, globally flexible space-grid. Infrared Fourier transform interferometry reveals the typical double-peak structure of a magnetically excited left-handed and an electrically excited right-handed pass-band that is maintained under strong bending and heating, and is sensitive to dielectrics. Exploiting UV/X-ray lithography and ultimately plastic moulding, meta-foils can be mass manufactured cost-effectively to serve as optical elements.

Using micromanufactured S-shaped gold strings suspended in free space by means of window-frames, we experimentally demonstrate an electromagnetic meta-material (EM(3)) in which the metallic structures are no longer embedded in matrices or deposited on substrates such that the response is solely determined by the geometrical parameters and the properties of the metal. Two carefully aligned and assembled window-frames form a bi-layer chip that exhibits 2D left-handed pass-bands corresponding to two different magnetic resonant loops in the range of 1.4 to 2.2 THz as characterized by Fourier transform interferometry and numerical simulation. Chips have a comparably large useful area of 56 mm(2). Our results are a step towards providing EM(3) that fulfill the common notions of a material.

As we live under a constant threat of global terrorism, the effective detection of highly energetic materials is one of the critical procedures needed at a variety of locations, including airports, border checkpoints, and entrances to high-security buildings. In this work, the application of optical-photothermal infrared (O-PTIR) spectromicroscopy for the detection of highly explosive materials within fingerprints is described. High-explosive (HE) materials (e.g., PETN, RDX, C-4, or TNT) were used to prepare contaminated fingerprints. These were subsequently deposited on various objects, including microscopic glass slides, a table, a mug, etc. Samples deposited on glass slides were directly sent for analyses; for other samples, adhesive tapes were used to lift off fingermarks. In cases of difficulty in locating fingerprints, additional powders were used to enhance their visibility. Experiments were performed with a mIRage IR microscope working in a noncontact, far-field reflection mode, offering submicron IR spectroscopy and imaging. Fast imaging (several characteristic absorbances were selected for every substance of interest) was used to locate “suspicious” particles among various residues present in fingerprints. Subsequently, spectra were collected for those particles. Reflection mode O-PTIR spectra taken from powdered and nonenhanced fingerprints were of comparable quality to transmission mode FTIR spectra collected for pure HEs. On the basis of the performed experiments, we consider O-PTIR spectromicroscopy to open a new avenue for the nondestructive, efficient, and reliable analysis of exogenous substances deposited within fingerprints. The real significance of O-PTIR is in its ability to deliver high-quality, spatially resolved FTIR transmission-like spectra below the diffraction limit of infrared wavelengths, doing so in an easy-to-use reflection (far-field) mode. Collected spectra are also searchable and interpretable in both commercial and institutional IR databases without mathematical modeling.

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Undesired mask-induced effects caused by thick absorber layers in EUV photomasks reduce the quality of the projected patterns at the wafer stage in EUV photolithography scanners. New materials with better absorption properties than the state-of-the-art absorbers, TaN and TaBN, are required to mitigate these effects. In this work, we investigated the optical properties (δ and k) of Te and TeO films in the 13-14 nm range, and the absorption properties of these two materials at 13.5 nm. δ and k are obtained through fitting experimental values of reflectivity versus angle of incidence in the EUV range. We follow a methodology which combines different characterization techniques (X-ray reflectivity, EUV reflectivity, and X-ray photoemission spectroscopy) to reduce the number of free parameters in models and hence, increase the reliability of the optical constants obtained. At 13.5 nm, we obtain δ=0.03120, k = 0.07338 for Te, and δ=0.04099, k = 0.06555 for TeO. To experimentally verify the absorption properties of these materials, different thicknesses of Te and TeO films are cast on top of a state-of-the-art mask-quality EUV multilayer with 66.7% reflectivity at 13.5 nm. We found that a reflectivity of ∼0.7% can be attained with either 32.4 nm of Te, or 34.7 nm of TeO, greatly surpassing the absorption properties of TaN and TaBN. The morphology and surface roughness of the Te and TeO films deposited on the multilayer are also investigated.