The scattering of an electromagnetic plane wave incident upon an inhomogeneous multilayer structure is considered in symbolic form. In this framework a scattering-matrix propagation algorithm that decouples recurrences for backward- and forward-scattered wave amplitudes is developed. By construction the scattering-matrix solution procedure is stable against increase of truncation order and depths and number of layers, irrespective of numerical implementation. For grating structures a numerical study using Fouriertransform discretization is performed. In this implementation the convergence issue for TM polarization is recapitulated.
A new dielectric Fabry-Perot cavity was designed for a resonant enhancing optical absorption by a thin absorber layer embedded into the cavity. In this cavity, the front mirror is a subwavelength grating with ∼ 100% retroreflection. For a HgCdTe absorber in a matching cavity of the new type, the design is shown to meet the combined challenges of increasing the absorbing efficiency of the entire device up to ∼ 100 % and reducing its size and overall complexity, compared to a conventional resonant cavity enhanced HgCdTe absorber, while maintaining a fairly good tolerance against the grating's fabrication errors.Keywords Optical resonant cavity · Photodetectors · HgCdTe · Gratings Here λ 0 is a resonance wavelength n c and t c is the refractive index (RI) and length of the FP cavity, respectively, ϕ f and ϕ b are the reflection phase of the mirror that
The antireflection properties of V-grooved gratings in (100)crystalline silicon are studied numerically by use of rigorouselectromagnetic theory. This study shows that these gratings canexhibit antireflective behavior only for TM-polarizedradiation. The V-grooved structures are analyzed as a function ofgrating period, duty cycle, and depth of a SiO(2) mask layerthat is added to the tops of the V-grooved mesas. Specificantireflection grating designs (the duty cycle and depth versus theperiod) are presented that illustrate TM-polarized reflectivity muchless than 10(-3) with periods as high as 80% the wavelengthof incident radiation. These designs exhibit good tolerance tofabrication errors and grating's plane deviations in aplanar-diffraction mounting.
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