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Al/AlOx/Al-layer systems are frequently used for Josephson junction-based superconducting devices. Although much work has been devoted to the optimization of the superconducting properties of these devices, systematic studies on influence of deposition conditions combined with structural analyses on the nanoscale are rare up to now. We have focused on the optimization of the structural properties of Al/AlOx/Al-layer systems deposited on Si (111) substrates with a particular focus on the thickness homogeneity of the AlOx-tunnel barrier. A standard high-vacuum electron-beam deposition system was used and the effect of substrate pretreatment, different Al-deposition temperatures and Al-deposition rates was studied. Transmission electron microscopy was applied to analyze the structural properties of the Al/AlOx/Al-layer systems to determine the thickness homogeneity of the AlOx layer, grain size distribution in the Al layers, Al-grain boundary types and the morphology of the Al/AlOx interface. We show that the structural properties of the lower Al layer are decisive for the structural quality of the whole Al/AlOx/Al-layer system. Optimum conditions yield an epitaxial Al(111) layer on a Si(111) substrate with an Al-layer thickness variation of only 1.6 nm over more than 10 m and large lateral grain sizes up to 1 m. Thickness fluctuations of the AlOx-tunnel barrier are minimized on such an Al layer which is essential for the homogeneity of the tunnel current. Systematic variation of the Al-deposition rate and deposition temperature allows to develop an understanding of the growth mechanisms.

This work is concerned with Al/Al-oxide(AlOx)/Al-layer systems which are important for Josephson-junction-based superconducting devices such as quantum bits. The device performance is limited by noise, which has been to a large degree assigned to the presence and properties of two-level tunneling systems in the amorphous AlOx tunnel barrier. The study is focused on the correlation of the fabrication conditions, nanostructural and nanochemical properties and the occurrence of two-level tunneling systems with particular emphasis on the AlOx-layer. Electron-beam evaporation with two different processes and sputter deposition were used for structure fabrication, and the effect of illumination by ultraviolet light during Al-oxide formation is elucidated. Characterization was performed by analytical transmission electron microscopy and low-temperature dielectric measurements. We show that the fabrication conditions have a strong impact on the nanostructural and nanochemical properties of the layer systems and the properties of two-level tunneling systems. Based on the understanding of the observed structural characteristics, routes are suggested towards the fabrication of Al/AlOx/Al-layers systems with improved properties.

Electron energy loss spectroscopy (EELS) in a monochromated transmission electron microscope is applied to probe standing-wave-like cavity modes hybridized with surface plasmon polaritons (SPP) in rectangular submicron slits in a thin gold film. Coupling of hybridized SPP-cavity modes between two adjacent slits is studied by systematically varying the width of the metal bar d that separates the identical slits in a two-slit system. Measurements on two-slit systems with different slit lengths L and fixed width reveal energy shifts and mode splitting of the fundamental SPP cavity mode which can be generally described as a function of a dimensionless scaling parameter L/d. Numerical simulations with the Discontinuous Galerkin Time-Domain (DGTD) method confirm the experimental data and reveal insights into the underlying complex coupling mechanisms.

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The structural and nanochemical properties of thin AlOx layers are decisive for the performance of advanced electronic devices. For example, they are frequently used as tunnel barriers in Josephson junction-based superconducting devices. However, systematic studies of the influence of oxidation parameters on structural and nanochemical properties are rare up to now, as most studies focus on the electrical properties of AlOx layers. This study aims to close this gap by applying transmission electron microscopy in combination with electron energy loss spectroscopy to analyze the structural and nanochemical properties of differently fabricated AlOx layers and correlate them with fabrication parameters. With respect to the application of AlOx as tunnel barrier in superconducting Josephson junctions, Al/AlOx/Al-layer systems were deposited on Si substrates. We will show that the oxygen content and structure of amorphous AlOx layers is strongly dependent on the fabrication process and oxidation parameters.Dynamic and static oxidation of Al yields oxygen-deficient amorphous AlOx layers, where the oxygen content ranges from x = 0.5 to x = 1.3 depending on oxygen pressure and substrate temperature. Thicker layers of stoichiometric crystalline -Al2O3 layers were grown by electron-beam evaporation of Al2O3 and reactive sputter deposition.

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