In this work, a new type of short water vapor treatment of the interface between the p-and i-layer is presented. This novel treatment is performed under vacuum below 1 mbar for 5 min and considerably reduces the i-layer boron contamination in amorphous silicon (a-Si:H) p-i-n solar cells prepared in single-chamber reactors. A significant advantage is that the substrate with the p-layer can remain loaded in the reactor during this oxidation treatment. The high effectiveness of this treatment in reducing the boron cross-contamination is directly supported by secondary ion mass spectroscopy measurements, by tracing the boron concentration depth profile across the p-i interface and by quantum efficiency measurements of the deposited cells. By applying this water vapor treatment, 0.3-mm-thick a-Si:H p-i-n solar cells of 1 cm with high initial conversion efficiencies of 10.1% are 2 deposited in a commercial large-area (35=45 cm ) single-chamber PECVD KAI reactor and can clearly compete with cells 2 deposited in multi-chamber systems. Light soaking of these cells for 1200 h at 50 8C leads to stabilized efficiencies of 8.2%. The relative typical efficiency degradation of 20% of such 0.3-mm-thick single-junction cells demonstrates that this treatment does not affect the stability in a negative manner.
UNAXlS KAI PECVD reactors developed for AM LCD technology have been demonstrated to possess a high potential for thin film silicon solar cells based on amorphous and microcrystalline silicon. For the next generation of thin film modules with highty effective lighttrapping LP-CVD ZnO large-area deposition is developed at Unaxis as well, in combination with a very simple but effective back reflector concept. A first prototype module of 0.447 m2 active area with 7.1 % initial efficiency has been achieved for amorphous silicon. Micromorph minimodules were prepared with 9.3 % initial aperture efficiency. All important module fabrication steps are under development at Unaxis for a complete line concept. silicon TFT's on glass for flat panel displays. To react on the fast growing display market over the last ten years, different generations of large-area KAI production equipment have been developed. These KAI manufacturing systems as schematically shown in Fig. I are well approved in display production, they run 24h a day, 360 days a year at a high uptime.
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