We have investigated phosphorus ion ͑P + ͒ implantation in Si nanocrystals ͑SiNCs͒ embedded in SiO 2 , in order to clarify the P donor doping effects for photoluminescence ͑PL͒ of SiNCs in wide P concentrations ranging in three orders. Some types of defects such as P b centers were found to remain significantly at the interfaces between SiNCs and the surrounding SiO 2 even by high-temperature ͑1000°C͒ annealing of all the samples. Hydrogen atom treatment ͑HAT͒ method can efficiently passivate remaining interface defects, leading to significant increase in the intensity of PL arising from the recombination of electron-hole pairs confined in SiNCs, in addition to significant decrease in interface defects with dangling bonds detected by electron spin resonance. From both the results of the P dose dependence before and after HAT, it is found that the amount of remaining defects is higher for samples with SiNCs damaged by implantation with relatively lower P + doses and then annealed, and that through HAT the observed PL intensity increases surely as the P concentration increases up to a critical concentration. Then it begins to decrease due to Auger nonradiative recombination above the critical concentration which depends on the size of SiNCs. These results suggest an effect of relatively low concentration of P atoms for the enhancement of PL intensity of SiNCs and we present an unconventional idea for explaining it.

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Si nanocrystals (SiNCs) embedded in formed amorphous SiO 2 layer and P nanoscale doping have been investigated by electron spin resonance (ESR) measurements at low temperatures. Hydrogen atom treatment is found to be required to determine the proper doping effects and electronic states of doped donors and quasi-conduction electrons in SiNCs. The dependences of microwave power and temperature for the ESR hyperfine structure of isolated P donors indicate that the spin-lattice relaxation time T 1 becomes longer with decreasing size of SiNCs. From the experimental results of donor concentration and temperature dependence, we propose a novel model that the spin property of SiNCs of approximately 5.8 nm size is strongly dependent on the number of donors doped in a SiNC, i.e., odd or even. Using this model, we also estimate the numbers of P donors included in each SiNC to be 1 to at most 6, which are less than 1/10 of the average P doping concentrations.

The formation of Si nanocrystallites ͑nc-Si͒ in erbium ͑Er͒-dispersed SiO x ͑x ഛ 2͒ films was investigated by in situ annealing while performing transmission electron microscopy measurements. The correlation between the formation of nc-Si and Er ion emissions was also comprehensively investigated by photoluminescence and electron spin resonance measurements. The results showed that the formation of nano-Si region with the suitable size is important for enhancement of Er ion emission.

The state-selective dissociation dynamics for anionic and excited neutral fragments of gaseous SiCl 4 following Cl 2p and Si 2p core-level excitations were characterized by combining measurements of the photoninduced anionic dissociation, x-ray absorption and UV/visible dispersed fluorescence. The transitions of core electrons to high Rydberg states/doubly excited states in the vicinity of both Si 2p and Cl 2p ionization thresholds of gaseous SiCl 4 lead to a remarkably enhanced production of anionic, Si − and Cl − , fragments and excited neutral atomic, Si * , fragments. This enhancement via core-level excitation near the ionization threshold of gaseous SiCl 4 is explained in terms of the contributions from the Auger decay of doubly excited states, shake-modified resonant Auger decay, or/and post-collision interaction. These complementary results provide insight into the state-selective anionic and excited neutral fragmentation of gaseous molecules via core-level excitation.