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The synthesis of composites thin films made by injecting an aerosol suspension of 20 nm‐size TiO2 nanoparticles (NPs) and isopropanol (IPA) in a filamentary argon Dielectric Barrier Discharge (DBD) is studied as a function of the DBD frequency from 1 to 50 kHz. The plasma is modulated to get homogeneous coatings. The deposition rate and morphology of the composite thin films are determined from SEM images of both surface and cross section. Their chemical composition is investigated by XPS, Raman spectroscopy and FTIR measurements. The structural composition of the NPs is examined by XRD. All the deposited composites show the chemical signature of the NPs as well as of the polymer‐like coating resulting from the plasma polymerization of IPA. No mixed phase is observed and the sizes of the NPs as well as of their aggregates are not affected by the plasma. With this method aerosol droplets are evaporated before entering the plasma and the NPs inside a same droplet are aggregated. Results show that the DBD frequency controls the composite composition by independently influencing the NPs transport and the matrix growth rate. At 1 kHz, the coating is essentially made of NPs with a low carbon coating. From 1 to 50 kHz, the Ti/C ratio is divided by two orders of magnitude. As the frequency increases the quantity of NPs decreases and since 10 kHz the matrix thickness increases. The decrease of the NPs is explained by the numerical modeling of the NPs trajectory. It is found that from 10 to 1 kHz, the lower is the frequency, the higher is the transport of the NPs to the surface due to the electrostatic force. On the other hand the matrix growth rate increases from almost zero at 10 kHz up to 19 nm · min−1 at 50 kHz because of the linear increases of the DBD power with the frequency.

A fast, efficient and simple method is presented for the production of high quality graphene on a large scale by using an atmospheric pressure plasma-based technique. This technique allows to obtain high quality graphene in powder in just one step, without the use of neither metal catalysts and nor specific substrate during the process. Moreover, the cost for graphene production is significantly reduced since the ethanol used as carbon source can be obtained from the fermentation of agricultural industries. The process provides an additional benefit contributing to the revalorization of waste in the production of a high-value added product like graphene. Thus, this work demonstrates the features of plasma technology as a low cost, efficient, clean and environmentally friendly route for production of high-quality graphene.

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Nanocomposite thin films of TiO in a polymer-like matrix are grown in a filamentary argon (Ar) dielectric barrier discharge (DBD) from a suspension of TiO nanoparticles in isopropanol (IPA). The sinusoidal voltage producing the plasma is designed to independently control the matrix growth rate and the transport of nanoparticle (NP) aggregates to the surface. The useful FSK (frequency shift keying) modulation mode is chosen to successively generate two sinusoidal voltages: a high frequency of 15 kHz and a low frequency ranging from 0.5 to 3 kHz. The coating surface coverage by the NPs and the thickness of the matrix are measured as a function of the FSK parameters. The duty cycle between these two signals is varied from 0 to 100%. It is observed that the matrix thickness is mainly controlled by the power of the discharge, which largely depends on the high-frequency value. The quantity of NPs deposited in the composite thin film is proportional to the duration of the low frequency applied. The FSK waveform has a double modulation effect, allowing us to obtain a uniform coating as the NPs are not affected by the high frequency and the matrix growth rate is limited when the low frequency is applied. When it is close to a frequency limit, the low frequency acts like a filter for the NP aggregates. The higher the frequency, the smaller the size of the aggregates transferred to the surface. By changing only the FSK modulation parameters, the thin film can be switched from superhydrophobic to superhydrophilic, and under suitable conditions, a nanocomposite thin film is obtained.

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