In this work, doctor blading is proposed for the fabrication of strongly-coupled QD solids from a PbS nanoink for photodetection at telecom wavelengths.
We report on the in-situ polymerization of 3T with Cu(ClO4)2 inside several host polymers such as Novolak-based
negative-tone photoresist, polystyrene (PS), poly(4-vinylphenol) (P4VP),
poly(methyl methacrylate) (PMMA), and poly(4-vinylphenol)-co-(methyl methacrylate) (P4VP-co-MMA)
to form an interpenetrating polymer network (IPN). Conducting IPN
films in the order of 10–4–150 S/cm are obtained
depending on the specific IPN composition. Moreover, the convenience
of this synthetic approach has been demonstrated using a commercially
available negative-tone photoresist based on Novolak as a host polymer.
Novolak photoresist was properly formulated with 3T and Cu(ClO4)2 to preserve as far as possible the negative
lithographic characteristics of Novolak-based photoresist and generate
conductive micropatterns by means of UV lithography. The CP is in
situ synthesized into the Novolak matrix by a postbake after the lithography
process (exposure + development). The electrical conductivity of the
patterned film is 10–2 S/cm. We accurately patterned
three different types of microstructures with different resolutions:
interdigitated structures with a width of 100 μm, 200 μm
side squares, and a 20 μm wide cross. We believe this synthetic
approach is of potential application to modify the conductivity of
numerous insulating polymers while preserving their physical and chemical
properties.
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