The statistical properties of speckles in paraxial optical systems depend on the system parameters. In particular, the speckle orientation and the lateral dependence (x and y) of the longitudinal speckle size can vary significantly. For example, the off-axis longitudinal correlation length remains equal to the onaxis size for speckles in a Fourier transform system, while it decreases dramatically as the observation position moves off axis in a Fresnel system. In this paper, we review the speckle correlation function in general linear canonical transform (LCT) systems, clearly demonstrating that speckle properties can be controlled by introducing different optical components, i.e., lenses and sections of free space. Using a series of numerical simulations, we examine how the correlation function changes for some typical LCT systems. The integrating effect of the camera pixel and the impact this has on the measured first-and second-order statistics of the speckle intensities is also examined theoretically. A series of experimental results are then presented to confirm several of these predictions. First, the effect the pixel size has on the measured first-order speckle statistics is demonstrated, and second, the orientation of speckles in a Fourier transform system is measured, showing that the speckles lie parallel to the optical axis.
We present a mask-aligner lithographic system operated with a frequency-quadrupled continuous-wave diode laser emitting at 193 nm. For this purpose, a 772 nm diode laser is amplified by a tapered amplifier in the master-oscillator power-amplifier configuration. The emission wavelength is upconverted twice, using LBO and KBBF nonlinear crystals in second-harmonic generation enhancement cavities. An optical output power of 10 mW is achieved. As uniform exposure field illumination is crucial in mask-aligner lithography, beam shaping is realized with optical elements made from fused silica and CaF featuring a diffractive non-imaging homogenizer. A tandem setup of shaped random diffusers, one static and one rotating, is used to control speckle formation. We demonstrate first experimental soft contact and proximity prints for a field size of 1 cm with a standard binary photomask and proximity prints with a two-level phase mask, both printed into 120 nm layers of photoresist on unstructured silicon substrates.
We present a novel industrial-grade prototype version of a continuous-wave 193 nm laser system entirely based on solid state pump laser technology. Deep-ultraviolet emission is realized by frequency-quadrupling an amplified diode laser and up to 20 mW of optical power were generated using the nonlinear crystal KBBF. We demonstrate the lifetime of the laser system for different output power levels and environmental conditions. The high stability of our setup was proven in > 500 h measurements on a single spot, a crystal shifter multiplies the lifetime to match industrial requirements. This laser improves the relative intensity noise, brilliance, wall-plug efficiency and maintenance cost significantly. We discuss first lithographic experiments making use of this improvement in photon efficiency.
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