Epitaxial growth of (111) oriented NiO layers on (−201) oriented β-Ga2O3 and vice versa have been carried out to obtain an all oxide p-n heterojunction (HJ) consisting of NiO/β-Ga2O3 and β-Ga2O3/NiO interfaces, respectively. Careful investigations by minimizing the effect of differential charging phenomena during x-ray photoelectron spectroscopy measurements yield a valence band offset (VBO) value of 1.6 ± 0.2 eV for both NiO/β-Ga2O3 and β-Ga2O3/NiO HJs. Thus, the VBO value is practically independent of the growth sequence for p-type NiO/n-type β-Ga2O3 HJs and follows band commutativity. The band diagram shows a staggered (type-II) band alignment and the value of the conduction band offset is found to be small (0.3 ± 0.2 eV). Our results are useful to design optoelectronic devices based on all oxide p-type NiO/n-type β-Ga2O3 HJs.

Epitaxial growth of α-Cr2O3(p-type) on c-Al2O3 and β-Ga2O3 (n-type) on α-Cr2O3(p-type) has been carried out to make an all oxide epitaxial n-type β-Ga2O3/p-type α-Cr2O3 heterojunction using RF sputtering. A valence band offset of 3.38 ± 0.2 eV at the heterojunction is determined using Kraut's method. From the bandgap measurements of α-Cr2O3 and β-Ga2O3, the conduction band offset of 1.68 ± 0.2 eV at the heterojunction is obtained. Thus, the band alignment at this heterojunction is found to be staggered (Type-II), which leads to the confinement of electrons and holes in the β-Ga2O3 layer and α-Cr2O3 layer, respectively. Our results provide a pathway to design all oxide optoelectronic devices based on a p-n heterojunction consisting of n-type β-Ga2O3 and p-type α-Cr2O3.

The valence band offset value of 2.3 ± 0.2 eV at epitaxial NiO/Al2O3 heterojunction is determined from photoelectron spectroscopy experiments. Pulsed laser deposited thin film of NiO on Al2O3 substrate is epitaxially grown along [111] direction with two domain structures, which are in-plane rotated by 60° with respect to each other. Observation of Pendellosung oscillations around Bragg peak confirms high interfacial and crystalline quality of NiO layer deposited on Al2O3 substrate. Surface related feature in Ni 2p3/2 core level spectra along with oxygen K-edge soft X-ray absorption spectroscopy results indicates that the initial growth of NiO on Al2O3 substrate is in the form of islands, which merge to form NiO layer for the larger coverage. The value of conduction band offset is also evaluated from the measured values of band gaps of NiO and Al2O3 layers. A type-I band alignment at NiO and Al2O3 heterojunction is also obtained. The determined values of band offsets can be useful in heterojunction based light emitting devices.

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