Gas-phase plasma-synthesized silicon nanocrystals (Si-NCs) are doped with boron (B) or phosphorous (P) during synthesis. The doping efficiency of B is smaller than that of P, consistent with the theoretical prediction of impurity formation energies. Despite vastly different synthesis conditions, the effect of doping on the photoluminescence (PL) of gas-phase-synthesized Si-NCs is qualitatively similar to that of Si-NCs doped during solid phase nucleation. Studies of oxidation-induced changes in PL and etching-induced changes in dopant concentration show that P resides at or near the Si-NC surface, while B is in the Si-NC cores. The oxidation of Si-NCs follows the Cabrera–Mott mechanism [N. Cabrera and N. F. Mott, Rep. Prog. Phys. 12, 163 (1948)].

A novel dual-plasma system has been developed to combine the synthesis of silicon nanocrystals (Si-NCs), the etching to controllably tailor the Si-NC size, and the surface functionalization of Si-NCs into one simple all-gas-phase process. Si-NCs are synthesized in SiH(4)-based plasma; they then travel through CF(4)-based plasma, where Si-NCs are etched and passivated by C and F. The resulting Si-NCs exhibit air-stable emission across the full visible spectrum. Structural and optical characterization indicates that the emission in the red-to-green range is based on the recombination of quantum-confined excitons in Si-NCs, while the blue emission originates from defect states. The quantum yields of stabilized photoluminescence from Si-NCs range from 16% at the red end to 1% at the blue end.

Nonthermal plasmas allow the preparation of ligand‐free quantum dots combining high production rates with superior crystalline quality and luminescence properties. Here, ZnO quantum dots are produced in a radiofrequency capacitively‐coupled plasma, exhibiting size dependent photoluminescent quantum yields up to 60% after air exposure—the highest reported to date for any compound semiconductor quantum dots prepared in the gas phase. Systematic studies indicate the importance of the surface for the observed luminescence behavior. The high luminescent quantum yields in the visible range of the spectrum and the ligand‐free, scalable synthesis make these quantum dots good candidates for light emitting applications.

Node-agnostic Cu TSVs integrated with high-K/metal gate and embedded DRAM were used in functional 3D modules.Thermal cycling and stress results show no degradation of TSV or BEOL structures, and device and functional data indicate that there is no significant impact from TSV processing and/or proximity.

The growth of silicon oxide on bare and SF6-etched silicon nanocrystals (Si-NCs), which were synthesized by an all gas phase approach, was investigated by examining the surface chemistry and optical properties of the NCs over time. Consistent with previous work in the low temperature oxidation of silicon, the oxidation follows the Cabrera–Mott mechanism, and the measured data are well fitted to the Elovich equation. The use of the SF6 plasma is found to reduce the surface Si–H bond density and dramatically increase the monolayer growth rate. This is believed to be due to the much larger volatility of Si–F bonds compared to Si–H bonds on the surface of the NC.